DIFFUSION OF IMPURITIES IN UNDERCOOLED MELT OF PULSE HEATED ION-IMPLANTED SILICON

被引：2
|
作者：
DVURECHENSKII, AV
GROTZSCHEL, R
IGONINA, NM
KOVAL, BA
LEBEDEVA, NI
机构：
[1] ACAD SCI GDR,ZENT INST KERNFORSCH,DDR-8051 DRESDEN,GER DEM REP
[2] ACAD SCI USSR,INST HIGH POWER ELECTR,TOMSK 634055,USSR
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1984年 / 84卷 / 01期
关键词：
D O I：
10.1002/pssa.2210840121
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：171 / 177
页数：7
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