DIFFUSION OF IMPURITIES IN UNDERCOOLED MELT OF PULSE HEATED ION-IMPLANTED SILICON

被引：2
|
作者：
DVURECHENSKII, AV
GROTZSCHEL, R
IGONINA, NM
KOVAL, BA
LEBEDEVA, NI
机构：
[1] ACAD SCI GDR,ZENT INST KERNFORSCH,DDR-8051 DRESDEN,GER DEM REP
[2] ACAD SCI USSR,INST HIGH POWER ELECTR,TOMSK 634055,USSR
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1984年 / 84卷 / 01期
关键词：
D O I：
10.1002/pssa.2210840121
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
下载
收藏
页码：171 / 177
页数：7
相关论文
共 50 条
  • [1] REDISTRIBUTION OF ION-IMPLANTED IMPURITIES IN SILICON DURING DIFFUSION IN OXIDIZING AMBIENTS
    WU, CP
    DOUGLAS, EC
    MUELLER, CW
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1976, 23 (09) : 1095 - 1097
  • [2] Diffusion of ion-implanted boron impurities into pre-amorphized silicon
    Ohno, N
    Hara, T
    Matsunaga, Y
    Current, MI
    Inoue, M
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2000, 3 (03) : 221 - 225
  • [3] LATERAL SPREAD OF ION-IMPLANTED IMPURITIES IN SILICON
    PAN, E
    FANG, FF
    JOURNAL OF APPLIED PHYSICS, 1974, 45 (06) : 2801 - 2803
  • [4] DIFFUSION OF ION-IMPLANTED ARSENIC IN SILICON
    FAIR, RB
    TSAI, JCC
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (12) : 1689 - 1696
  • [5] DIFFUSION OF ION-IMPLANTED ARSENIC IN SILICON
    FAIR, RB
    TSAI, JCC
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (08) : C258 - C258
  • [6] DIFFUSION OF ION-IMPLANTED PHOSPHORUS IN SILICON
    CHELYADINSKII, AR
    TAHER, HIH
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1994, 142 (02): : 331 - 338
  • [7] CLUSTERING, PRECIPITATION AND DIFFUSION IN ION-IMPLANTED SILICON
    BENNETT, DJ
    PRICE, TE
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1994, 9 (01) : 5 - 9
  • [8] THE DIFFUSION OF ION-IMPLANTED BORON IN SILICON DIOXIDE
    NG, J
    GIBBONS, JF
    SIGMON, T
    AIP CONFERENCE PROCEEDINGS, 1984, (122) : 20 - 33
  • [9] Characterization of ion-implanted gallium diffusion in silicon
    Sato, Y., 1600, Japan Society of Applied Physics (43):
  • [10] Diffusion of ion-implanted boron and silicon in germanium
    Uppal, S
    Willoughby, AFW
    Bonar, JM
    Cowern, NEB
    Morris, RJH
    Dowsett, MG
    HIGH-MOBILITY GROUP-IV MATERIALS AND DEVICES, 2004, 809 : 237 - 242
12345