CHARACTERIZATION OF GAAS FILMS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引：24
|
作者：
SWAMINATHAN, V
VANHAREN, DL
ZILKO, JL
LU, PY
SCHUMAKER, NE
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 12期
关键词：
D O I：
10.1063/1.334854
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：5349 / 5353
页数：5
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