CHARACTERIZATION OF GAAS FILMS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引：24

|

作者：

SWAMINATHAN, V

VANHAREN, DL

ZILKO, JL

LU, PY

SCHUMAKER, NE

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 12期

关键词：

D O I：

10.1063/1.334854

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：5349 / 5353

页数：5

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