Photoresists for microlithography2. The role of polymer microstructure

被引：0
|
作者：
Debmalya Roy
P. K. Basu
S. V. Eswaran
机构：
[1] Solid State Physics Laboratory,Deshbandhu College
[2] University of Delhi Kalkaji,undefined
来源：
Resonance | 2002年 / 7卷 / 8期
关键词：
High ortho novolak resins; NMR and lithographic performance; device fabrication;
D O I：
10.1007/BF02836025
中图分类号：
学科分类号：
摘要：
Characteristics of photoresists used in microlithography are highlighted. The microstructure of the matrix polymer used in these photoresists is critical for ensuring good lithographic performance and the same can be evaluated by using modern NMR spectroscopic techniques. It is now well-known that highly ordered ‘alternate’ and ‘semi-alternate’ tailor-made novolaks lead to better performing photoresists.
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页码：59 / 66
页数：7
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