Alicyclic photoresists for CO2-based microlithography at 157 nm.

被引：0
|
作者：
Boggiano, MK
DeSimone, J
机构：
[1] Univ N Carolina, Dept Chem, Chapel Hill, NC 27514 USA
[2] N Carolina State Univ, Dept Chem Engn, Raleigh, NC 27695 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2002年 / 224卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
149-PMSE
引用
收藏
页码：U512 / U512
页数：1
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