Photoresists for CO2-based next-generation microlithography

被引：0
|
作者：
Boggiano, MK [1 ]
DeSimone, JM [1 ]
机构：
[1] Univ N Carolina, Dept Chem, Chapel Hill, NC 27599 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2005年 / 229卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
83-PMSE
引用
收藏
页码：U1115 / U1116
页数：2
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