Highly Efficient Color Separation and Focusing in the Sub-micron CMOS Image Sensor

被引:5
|
作者
Yun, Seokho [1 ]
Roh, Sookyoung [1 ]
Lee, Sangyun [1 ]
Park, Hongkyu [1 ]
Lim, Minwoo [1 ]
Ahn, Sungmo [1 ]
Choo, Hyuck [1 ]
机构
[1] Samsung Adv Inst Technol, Suwon, Gyeonggi Do, South Korea
关键词
D O I
10.1109/IEDM19574.2021.9720592
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report nanoscale metaphotonic color-routing (MPCR) structure that can significantly improve the low-light performance of a sub-micron CMOS image sensor. Fabricated on the Samsung's commercial 0.8 mu m-pixel sensor, MPCR structures separate the incident light energy into appropriate color pixels at high efficiency, yielding increased quantum efficiency up to +20%. Our experimental demonstration confirms a luminance SNR improvement of +1.22 dB under low light condition of 5 lux, accompanied with a comparably low color reproduction error and great angular tolerant response.
引用
收藏
页数:4
相关论文
共 50 条
  • [1] Advanced Color Filter Isolation Technology for Sub-Micron Pixel of CMOS Image Sensor
    Bak, Hojin
    Lee, Horyeong
    Kim, Won-Jin
    Choi, Inho
    Kim, Hanjun
    Kim, Dongha
    Lee, Hanseung
    Han, Sukman
    Lee, Kyoung-In
    Do, Youngwoong
    Cho, Minsu
    Baek, Moung-Seok
    Kim, Kyungdo
    Park, Wonje
    Kang, Seong-Hun
    Hong, Sung-Joo
    Oh, Hoon-Sang
    Song, Changrock
    [J]. 2022 INTERNATIONAL ELECTRON DEVICES MEETING, IEDM, 2022,
  • [2] Inertial focusing with sub-micron resolution for separation of bacteria
    Cruz, Javier
    Graells, Tiscar
    Wallden, Mats
    Hjort, Klas
    [J]. LAB ON A CHIP, 2019, 19 (07) : 1257 - 1266
  • [3] LITHOGRAPHY FOR A SUB-MICRON CMOS PROCESS
    POPPERT, P
    NOVAK, S
    WRIGHT, P
    [J]. PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1985, 538 : 46 - 50
  • [4] MAGNETIC SEPARATION OF SUB-MICRON PARTICLES
    TAKAYASU, M
    GERBER, R
    FRIEDLAENDER, FJ
    [J]. IEEE TRANSACTIONS ON MAGNETICS, 1983, 19 (05) : 2112 - 2114
  • [5] TECHNIQUES FOR MEASUREMENT OF SUB-MICRON SEPARATION
    KANEKO, R
    [J]. JOURNAL OF JAPAN SOCIETY OF LUBRICATION ENGINEERS, 1978, 23 (10): : 715 - 718
  • [6] Library building for sub-micron CMOS process
    Kai, Z
    Wang, DH
    Li, YG
    [J]. 2003 5TH INTERNATIONAL CONFERENCE ON ASIC, VOLS 1 AND 2, PROCEEDINGS, 2003, : 1369 - 1372
  • [7] Channel engineering for sub-micron CMOS technologies
    Dixit, A
    Pal, DK
    Roy, JN
    Rao, VR
    [J]. PROCEEDINGS OF THE ELEVENTH INTERNATIONAL WORKSHOP ON THE PHYSICS OF SEMICONDUCTOR DEVICES, VOL 1 & 2, 2002, 4746 : 637 - 640
  • [8] A SUB-MICRON CMOS SOS PROCESS FOR VLSI
    MADDOX, R
    CASEY, N
    SALLEE, C
    KINOSHITA, F
    IMERSON, R
    WHITCOMB, G
    [J]. SOLID STATE TECHNOLOGY, 1982, 25 (04) : 240 - 246
  • [9] GATE MATERIALS CONSIDERATION FOR SUB-MICRON CMOS
    TING, CY
    DAVARI, B
    [J]. APPLIED SURFACE SCIENCE, 1989, 38 (1-4) : 416 - 428
  • [10] HOT CARRIER EFFECTS IN SUB-MICRON CMOS
    AKERS, LA
    WALKER, M
    [J]. PHYSICA B & C, 1985, 134 (1-3): : 116 - 119