Early stage of tin oxide film growth in chemical vapor deposition

被引：20
|
作者：
Matsui, Y [1 ]
Mitsuhashi, M [1 ]
Goto, Y [1 ]
机构：
[1] Asahi Glass Co Ltd, New Prod Dev Ctr, Fabr Glass Div, Kanagawa 2430301, Japan
来源：
SURFACE & COATINGS TECHNOLOGY | 2003年 / 169卷
关键词：
nucleation; atomic force microscopy; atmospheric pressure chemical vapor deposition; Tin oxide;
D O I：
10.1016/S0257-8972(03)00205-6
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Early stage of film growth was studied for chemical vapor deposition tin oxide films. Nucleation of films was observed by using an atomic force microscope. It was found nucleation structure of the crystallites changed from isolated island-like to tightly interconnected as methanol concentration into source gases increased. (C) 2003 Elsevier Science B.V. All tights reserved.
引用
收藏
页码：549 / 552
页数：4
相关论文
共 50 条
  • [31] Thermal chemical vapor deposition of tin oxide nanowires in a hydrogen reduction atmosphere
    Jeong, Won
    Kang, Hyon Chol
    CERAMICS INTERNATIONAL, 2018, 44 (08) : 9801 - 9808
  • [32] PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF TIN OXIDE COATINGS
    INAL, OT
    BENGISU, M
    GUARDIAN, J
    JOURNAL OF MATERIALS SCIENCE, 1993, 28 (05) : 1155 - 1160
  • [33] Development of tin oxide synthesis by plasma-enhanced chemical vapor deposition
    Robbins, JJ
    Alexander, RT
    Bai, M
    Huang, YJ
    Vincent, TL
    Wolden, CA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2001, 19 (06): : 2762 - 2766
  • [34] Synthesis and Characterization of Tin(IV) Oxide Obtained by Chemical Vapor Deposition Method
    Svitlana V. Nagirnyak
    Victoriya A. Lutz
    Tatiana A. Dontsova
    Igor M. Astrelin
    Nanoscale Research Letters, 2016, 11
  • [35] Synthesis and Characterization of Tin(IV) Oxide Obtained by Chemical Vapor Deposition Method
    Nagirnyak, Svitlana V.
    Lutz, Victoriya A.
    Dontsova, Tatiana A.
    Astrelin, Igor M.
    NANOSCALE RESEARCH LETTERS, 2016, 11
  • [36] Preparation of tin oxide self-assembly nanostructures by chemical vapor deposition
    Liu Xing-Hui
    Tang Dong-Sheng
    Zeng Chun-Lai
    Hai Kuo
    Xie Si-Shen
    ACTA PHYSICO-CHIMICA SINICA, 2007, 23 (03) : 361 - 366
  • [37] Parameters study on the growth of GaAs nanowires on indium tin oxide by metal-organic chemical vapor deposition
    Wu, Dan
    Tang, Xiaohong
    Wang, Kai
    Olivier, Aurelien
    Li, Xianqiang
    JOURNAL OF APPLIED PHYSICS, 2016, 119 (09)
  • [38] Bandgap narrowing in high dopant tin oxide degenerate thin film produced by atmosphere pressure chemical vapor deposition
    Lin, Yang-Yi
    Lee, Hsin-Yi
    Ku, Ching-Shun
    Chou, Li-Wei
    Wu, Albert T.
    APPLIED PHYSICS LETTERS, 2013, 102 (11)
  • [39] Zinc oxide thin film synthesized by combustion chemical vapor deposition
    Li, Zhi-Yang
    Xu, Fuchun
    Wu, Qi-Hui
    Li, Jing
    APPLIED SURFACE SCIENCE, 2008, 255 (05) : 2859 - 2863
  • [40] Growth of polycrystalline GaN thin film on indium tin oxide glass substrate with eliminated ion damage by RF plasma enhanced chemical vapor deposition
    Park, DC
    Ko, HC
    Fujita, S
    Fujita, S
    BLUE LASER AND LIGHT EMITTING DIODES II, 1998, : 472 - 475
12345