Towards sub-100-nm X-ray microscopy for tomographic applications

被引：10
|
作者：
Bruyndonckx, P. [1 ]
Sasov, A. [1 ]
Pauwels, B. [1 ]
机构：
[1] Skyscan, B-2550 Kontich, Belgium
来源：
POWDER DIFFRACTION | 2010年 / 25卷 / 02期
关键词：
nanotomography; nanofocal spot size; X-ray microscopy;
D O I：
10.1154/1.3416936
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
We have demonstrated that structures down to 150 nm can be visualized in X-ray projection images using nanofocus X-ray sources. Due to their unlimited depth of focus, they do not possess a limit on the specimen size. This is essential for three-dimensional tomographic imaging of samples with a diameter larger than a few microns. Further simulation studies have shown that optimization of the detector response curve and switching from a reflective X-ray target to a transmission target should allow us to reach sub-100-nm resolutions. (C) 2010 International Centre for Diffraction Data. [DOI: 10.1154/1.3416936]
引用
收藏
页码：157 / 160
页数：4
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