An ultraviolet-curable mold for Sub-100-nm lithography

被引：0
|
作者：
机构：
来源：
| 1600年 / American Chemical Society, Columbus, United States卷 / 126期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
No abstract available
引用
收藏
相关论文
共 50 条
  • [1] An ultraviolet-curable mold for sub-100-nm lithography
    Choi, SJ
    Yoo, PJ
    Baek, SJ
    Kim, TW
    Lee, HH
    JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2004, 126 (25) : 7744 - 7745
  • [2] Sub-100-nm three-dimensional nanoimprint lithography
    Unno, Noriyuki
    Taniguchi, Jun
    Ishii, Yoshiaki
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (06): : 2361 - 2364
  • [3] Sub-100-nm lithography with miniature electron beam columns
    Muray, L. P.
    Silver, C. S.
    Spallas, J. P.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (06): : 2945 - 2950
  • [4] Flow lithography in ultraviolet-curable polydimethylsiloxane microfluidic chips
    Kim, Junbeom
    An, Heseong
    Seo, Yoojin
    Jung, Youngmee
    Lee, Jong Suk
    Choi, Nakwon
    Bong, Ki Wan
    BIOMICROFLUIDICS, 2017, 11 (02):
  • [5] Resist process development for sub-100-nm ion projection lithography
    Hirscher, S
    Kaesmaier, R
    Domke, WD
    Wolter, A
    Löschner, H
    Cekan, E
    Horner, C
    Zeininger, M
    Ochsenhirt, J
    MICROELECTRONIC ENGINEERING, 2001, 57-8 : 517 - 530
  • [6] Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
    Wachulak, P. W.
    Patel, D.
    Capeluto, M. G.
    Menoni, C. S.
    Rocca, J. J.
    Marconi, M. C.
    SOFT X-RAY LASERS AND APPLICATIONS VII, 2007, 6702
  • [7] Sub-100-nm device fabrication using proximity X-ray lithography at five levels
    Iba, Y
    Taguchi, T
    Kumasaka, F
    Iizuka, T
    Sambonsugi, Y
    Aoyama, H
    Deguchi, K
    Fukuda, M
    Oda, M
    Morita, H
    Matsuda, T
    Horiuchi, K
    Matsui, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2000, 39 (12B): : 6952 - 6956
  • [8] Preparation of sub-100-nm β-lactoglobulin (BLG) nanoparticles
    Ko, Sanghoon
    Gunasekaran, Sundaram
    JOURNAL OF MICROENCAPSULATION, 2006, 23 (08) : 887 - 898
  • [9] Sub-100-nm photolithography based on plasmon resonance
    Luo, Xiangang
    Ishihara, Teruya
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2004, 43 (6 B): : 4017 - 4021
  • [10] Ultraviolet-curable liquid natural rubber
    Phinyocheep, P
    Duangthong, S
    JOURNAL OF APPLIED POLYMER SCIENCE, 2000, 78 (08) : 1478 - 1485
12345