Towards sub-100-nm X-ray microscopy for tomographic applications

被引：10

作者：

Bruyndonckx, P. ^{[1
]}

Sasov, A. ^{[1
]}

Pauwels, B. ^{[1
]}

机构：

[1] Skyscan, B-2550 Kontich, Belgium

来源：

POWDER DIFFRACTION | 2010年 / 25卷 / 02期

关键词：

nanotomography; nanofocal spot size; X-ray microscopy;

D O I：

10.1154/1.3416936

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We have demonstrated that structures down to 150 nm can be visualized in X-ray projection images using nanofocus X-ray sources. Due to their unlimited depth of focus, they do not possess a limit on the specimen size. This is essential for three-dimensional tomographic imaging of samples with a diameter larger than a few microns. Further simulation studies have shown that optimization of the detector response curve and switching from a reflective X-ray target to a transmission target should allow us to reach sub-100-nm resolutions. (C) 2010 International Centre for Diffraction Data. [DOI: 10.1154/1.3416936]

引用

页码：157 / 160

页数：4

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