Ultraviolet LED Light source System for Lithography

被引:3
|
作者
Wang, Guogui [1 ]
Gao, Yiqing [1 ]
Xiao, Mengchao [1 ]
机构
[1] Nanchang Hangkong Univ, Measuring & Opt Engn Acad, Nanchang 330063, Peoples R China
关键词
UV LED; CPC; fly's lens; Lithography;
D O I
10.4028/www.scientific.net/AMM.667.405
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
We designed a lithographic system, which consists of an ultraviolet LED array as the source, a Compound Parabolic Collector (CPC) as the light collection and collimator, a double fly's eye len and a convergent lens as light energy Homogenization unit. The second fly's lens as a field lens is placed to the back focal plane of the first one to improve the light energy uniformity as the light rays output from the CPC are not strictly parallel. The simulation based on optical software indicated that the lithographic system is good at collecting and distributing uniformly light energy. It is a better solution as ultraviolet LED is good at space, price, Environmental Protection compared with Ultraviolet (UV) laser and high pressure mercury lamp.
引用
收藏
页码:405 / 408
页数:4
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