Development of a plasma laser source for lithography in extreme ultraviolet

被引：0
|
作者：
Soullié, G [1 ]
Lafon, C [1 ]
Rosch, R [1 ]
Babonneau, D [1 ]
Garaude, F [1 ]
Huelvan, S [1 ]
Trublet, T [1 ]
Bonnet, L [1 ]
Marmoret, R [1 ]
机构：
[1] CEA, DAM Ile de France, F-91680 Bruyeres Le Chatel, France
来源：
JOURNAL DE PHYSIQUE IV | 2003年 / 108卷
关键词：
D O I：
10.1051/jp4:20030643
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：275 / 279
页数：5
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