Extreme ultraviolet spectroscopy of a laser plasma source for lithography

被引：2
|
作者：
Bijkerk, F
Shevelko, AP
Shmaenok, LA
Churilov, SS
机构：
来源：
APPLICATIONS OF X RAYS GENERATED FROM LASERS AND OTHER BRIGHT SOURCES | 1997年 / 3157卷
关键词：
D O I：
10.1117/12.283984
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Spectra from various target materials from a KrF-laser plasma source have been investigated in the Extreme UV spectral range between 12 and 17 nm using an off-Rowland grazing-incidence spectrograph. Additional calibration of the yield at 13 nm and measurement of the spatial and temporal characteristics of the plasma has been done using and a combination of a multilayer mirror and XUV diode or fiber image carrier system.
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收藏
页码：236 / 240
页数：5
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