Ultraviolet LED Light source System for Lithography

被引:3
|
作者
Wang, Guogui [1 ]
Gao, Yiqing [1 ]
Xiao, Mengchao [1 ]
机构
[1] Nanchang Hangkong Univ, Measuring & Opt Engn Acad, Nanchang 330063, Peoples R China
关键词
UV LED; CPC; fly's lens; Lithography;
D O I
10.4028/www.scientific.net/AMM.667.405
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
We designed a lithographic system, which consists of an ultraviolet LED array as the source, a Compound Parabolic Collector (CPC) as the light collection and collimator, a double fly's eye len and a convergent lens as light energy Homogenization unit. The second fly's lens as a field lens is placed to the back focal plane of the first one to improve the light energy uniformity as the light rays output from the CPC are not strictly parallel. The simulation based on optical software indicated that the lithographic system is good at collecting and distributing uniformly light energy. It is a better solution as ultraviolet LED is good at space, price, Environmental Protection compared with Ultraviolet (UV) laser and high pressure mercury lamp.
引用
收藏
页码:405 / 408
页数:4
相关论文
共 50 条
  • [41] Illumination optimization method of LED light source for visual inspection system
    Chao Y.
    Xu P.
    Tang H.
    Shi F.
    Zhang Z.
    Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering, 2021, 50 (12):
  • [42] Succulent Growth Environment Control System Based on LED Light Source
    Mai, Qiang
    Liang, Jiaming
    Deng, Cheng
    Zhang, Qinfeng
    BASIC & CLINICAL PHARMACOLOGY & TOXICOLOGY, 2020, 126 : 96 - 97
  • [43] A holographic display system based on DMD using LED as light source
    Su, Ping
    Cheng, Bingchao
    Cao, Wenbo
    Ma, Jianshe
    Cao, Liangcai
    OPTICS AND PHOTONICS FOR INFORMATION PROCESSING X, 2016, 9970
  • [44] Achromatic design in the illumination system for a mini projector with LED light source
    Pan, Jui-Wen
    Lin, Sheng-Han
    OPTICS EXPRESS, 2011, 19 (17): : 15750 - 15759
  • [45] Visual color matching system based on RGB LED light source
    Sun, Lei
    Huang, Qingmei
    Feng, Chen
    Li, Wei
    Wang, Chaofeng
    2017 INTERNATIONAL CONFERENCE ON OPTICAL INSTRUMENTS AND TECHNOLOGY: OPTICAL SYSTEMS AND MODERN OPTOELECTRONIC INSTRUMENTS, 2017, 10616
  • [46] Elastomer spatial light modulators for extreme ultraviolet lithography
    Wang, JS
    Jung, IW
    Solgaard, O
    BOSTON TRANSDUCERS'03: DIGEST OF TECHNICAL PAPERS, VOLS 1 AND 2, 2003, : 1458 - 1461
  • [47] UV-LED Lithography System and Characterization
    Shiba, Sabera Fahmida
    Beavers, Jace
    Laramore, Diego
    Lindstrom, Bo
    Broyles, James
    Gaither, Corey
    Hieber, Tyler
    Kim, Jungkwun 'JK'
    2020 IEEE 15TH INTERNATIONAL CONFERENCE ON NANO/MICRO ENGINEERED AND MOLECULAR SYSTEM (IEEE NEMS 2020), 2020, : 73 - 76
  • [48] Development of Extreme Ultraviolet Interference Lithography System
    Fukushima, Yasuyuki
    Sakagami, Naoki
    Kimura, Teruhiko
    Kamaji, Yoshito
    Iguchi, Takafumi
    Yamaguchi, Yuya
    Tada, Masaki
    Harada, Tetsuo
    Watanabe, Takeo
    Kinoshita, Hiroo
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (06) : 06GD061 - 06GD065
  • [49] Source for extreme ultraviolet lithography by the tabletop storage ring MIRRORCLE
    Yamada, Hironari
    Minkov, Dorian
    Toyosugi, Norio
    Morita, Masaki
    Hasegawa, Daisuke
    Moon, Ahsa
    Okoye, Ejike Kenneth
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2008, 7 (04):
  • [50] Source Development for Extreme Ultraviolet Lithography and Water Window Imaging
    O'Sullivan, G.
    Dunne, P.
    Kilbane, D.
    Liu, L.
    Lokasani, R.
    Long, E.
    Li, B. W.
    McCormack, T.
    O'Reilly, F.
    Shiel, J.
    Sokell, E.
    Suzuki, C.
    Wu, T.
    Higashiguchi, T.
    ATOMIC PROCESSES IN PLASMAS (APIP 2016), 2017, 1811