Method of scanning near-field optical lithography

被引：0

作者：

Dryakhlushin, VF ^{[1
]}

Vostokov, NV ^{[1
]}

Klimov, AY ^{[1
]}

Rogov, VV ^{[1
]}

Shashkin, VI ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Phys Microstruct, Nizhnii Novgorod 603600, Russia

来源：

12TH INTERNATIONAL CONFERENCE - MICROWAVE & TELECOMMUNICATION TECHNOLOGY, CONFERENCE PROCEEDINGS | 2002年

关键词：

D O I：

10.1109/CRMICO.2002.1137312

中图分类号：

TN [电子技术、通信技术];

学科分类号：

0809 ;

摘要：

A contact scanning near-field optical lithography method has been developed to enable fabrication of different nanoelements (metal, dielectric, etched in surface or its combinations) on the various surfaces (metal, dielectric, light- and heavy doped semiconductors). The method involves interaction of heated probe of scanning near-field optical microscope with two-layer coating, followed by pattern transfer onto sample surface. The software for creation of different nanoelements is developed. The nanoelements with characteristic dimensions of about 50 nm are fabricated.

引用

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页码：453 / 454

页数：2

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