Method of scanning near-field optical lithography

被引：0
|
作者：
Dryakhlushin, VF [1 ]
Vostokov, NV [1 ]
Klimov, AY [1 ]
Rogov, VV [1 ]
Shashkin, VI [1 ]
机构：
[1] Russian Acad Sci, Inst Phys Microstruct, Nizhnii Novgorod 603600, Russia
来源：
12TH INTERNATIONAL CONFERENCE - MICROWAVE & TELECOMMUNICATION TECHNOLOGY, CONFERENCE PROCEEDINGS | 2002年
关键词：
D O I：
10.1109/CRMICO.2002.1137312
中图分类号：
TN [电子技术、通信技术];
学科分类号：
0809 ;
摘要：
A contact scanning near-field optical lithography method has been developed to enable fabrication of different nanoelements (metal, dielectric, etched in surface or its combinations) on the various surfaces (metal, dielectric, light- and heavy doped semiconductors). The method involves interaction of heated probe of scanning near-field optical microscope with two-layer coating, followed by pattern transfer onto sample surface. The software for creation of different nanoelements is developed. The nanoelements with characteristic dimensions of about 50 nm are fabricated.
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页码：453 / 454
页数：2
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