Materials and process challenges in high resolution lithography.

被引：0

作者：

Angelopoulos, M ^{[1
]}

Mahorowala, A ^{[1
]}

Babich, K ^{[1
]}

Goldfarb, D ^{[1
]}

Pfeiffer, D ^{[1
]}

Huang, WS ^{[1
]}

Lin, QH ^{[1
]}

Medeiros, D ^{[1
]}

机构：

[1] IBM Corp, Thomas J Watson Res Ctr, Adv Lithog Dept, Yorktown Hts, NY 10598 USA

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2002年 / 224卷

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

071-PMSE

引用

页码：U499 / U499

页数：1

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