INOR 364-Advanced materials for high resolution soft lithography

被引：0
|
作者：
Choi, Kyung [1 ]
机构：
[1] Univ Calif Irvine, Irvine, CA 92697 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2008年 / 235卷
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D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
364-INOR
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页数：1
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