Prospects of photoresists for ArF immersion lithography.

被引：0
|
作者：
Conley, W [1 ]
机构：
[1] Int Sematech, Litog Div, Austin, TX 78741 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2004年 / 228卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
79-PMSE
引用
收藏
页码：U427 / U427
页数：1
相关论文
共 50 条
  • [1] A Reliable Higher Power ArF Laser with Advanced Functionality for Immersion Lithography.
    Kurosu, Akihiko
    Nakano, Masaki
    Yashiro, Masanori
    Yoshino, Masaya
    Tsushima, Hiroaki
    Masuda, Hiroyuki
    Kumazaki, Takahito
    Matsumoto, Shinichi
    Kakizaki, Kouji
    Matsunaga, Takashi
    Okazaki, Shinji
    Fujimoto, Junichi
    Mizoguchi, Hakaru
    OPTICAL MICROLITHOGRAPHY XXV, PTS 1AND 2, 2012, 8326
  • [2] Nonshrinkable photoresists for ArF lithography
    Kim, JB
    Oh, TH
    Choi, JH
    Lee, JJ
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XX, PTS 1 AND 2, 2003, 5039 : 689 - 697
  • [3] Progress in polymers and photoresists applicable for 193 nm lithography.
    Cook, M
    Klauck-Jacobs, A
    Oberlander, J
    Rahman, D
    Padmanaban, M
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1999, 218 : U616 - U616
  • [4] Development of Photoresists for ArF Excimer Laser Lithography
    Nozaki, Koji
    JOURNAL OF SYNTHETIC ORGANIC CHEMISTRY JAPAN, 2018, 76 (09) : 956 - 965
  • [5] What's next: Full immersion lithography.?
    不详
    SOLID STATE TECHNOLOGY, 2002, 45 (05) : 24 - 24
  • [6] Evolution of Negative Tone Development Photoresists for ArF Lithography
    Reilly, Michael
    Andes, Cecily
    Cardolaccia, Thomas
    Kim, Young Seok
    Park, Jong Keun
    ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIX, 2012, 8325
  • [7] Fluorocarbon polymer-based photoresists for 157-nm lithography.
    Fedynyshyn, TH
    Mowers, WA
    Kunz, RR
    Sinta, RF
    Sworin, M
    Cabral, A
    Curtin, J
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2002, 224 : U499 - U499
  • [8] Implications of immersion lithography on 193nm photoresists
    Taylor, JC
    Chambers, CR
    Deschner, R
    LeSuer, RJ
    Conley, W
    Burns, SD
    Willson, CG
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXI, PTS 1 AND 2, 2004, 5376 : 34 - 43
  • [9] Full field analysis of lithography performance for ArF immersion lithography
    Li, YQ
    Huang, GS
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (06): : 2679 - 2683
  • [10] PROSPECTS OF HIGH RESOLUTION X-RAY LITHOGRAPHY.
    Aristov, V.V.
    Erko, A.I.
    Kudryashov, V.A.
    Microelectronic Engineering, 1985, 3 (1-4) : 589 - 595
12345