Characterization of low temperature growth carbon nanofibers synthesized by using plasma enhanced chemical vapor deposition

被引:8
|
作者
Ikuno, T
Ryu, JT
Oyama, T
Ohkura, S
Baek, YG
Honda, S
Katayama, M
Hirao, T
Oura, K
机构
[1] Osaka Univ, Dept Elect Engn, Grad Sch Engn, Suita, Osaka 5650871, Japan
[2] Taeg Univ, Dept Comp & Commun Engn, Kyunpook 712714, South Korea
关键词
carbon nanofiber; field emission; low temperature growth;
D O I
10.1016/S0042-207X(02)00141-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Carbon nanofibers have been synthesized at a low temperature using plasma. Iron phthalocyanine was used as a source material for this process. The carbon nanofibers were grown in random orientation with a diameter of about 100 nm and length up to 10 mum. From the field emission measurement, the carbon nanofibers were found to exhibit an excellent characteristic of electron field emission as well as carbon nanotubes. Furthermore, we found the selective growth of nanofibers on scratched substrates. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:341 / 345
页数:5
相关论文
共 50 条
  • [31] Corn-shape carbon nanofibers with dense graphite synthesized by microwave plasma-enhanced chemical vapor deposition
    Hayashi, Y
    Tokunaga, T
    Soga, T
    Jimbo, T
    Yogata, Y
    Toh, S
    Kaneko, K
    APPLIED PHYSICS LETTERS, 2004, 84 (15) : 2886 - 2888
  • [32] Characterization of BCN films synthesized by radiofrequency plasma enhanced chemical vapor deposition
    Mannan, Md Abdul
    Nagano, Masamitsu
    Kida, Tetsuya
    Hirao, Norie
    Baba, Yuji
    JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 2009, 70 (01) : 20 - 25
  • [33] Low Temperature Growth of Carbon Nanostructures by Radio Frequency-Plasma Enhanced Chemical Vapor Deposition (Low Temperature Growth of Carbon Nanostructures by RF-PECVD)
    Rao, B. Purna Chandra
    Maheswaran, R.
    Ramaswamy, Shivaraman
    Mahapatra, Ojas
    Gopalakrishanan, C.
    Thiruvadigal, D. John
    FULLERENES NANOTUBES AND CARBON NANOSTRUCTURES, 2009, 17 (06) : 625 - 635
  • [34] Metrology and optical characterization of plasma enhanced chemical vapor deposition, (PECVD), low temperature deposited amorphous carbon films
    Ferrieu, F.
    Chaton, C.
    Neira, D.
    Beitia, C.
    Mota, L. Proenca
    Papon, A. M.
    Tarnowka, A.
    FRONTIERS OF CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS: 2007, 2007, 931 : 99 - +
  • [35] Low temperature synthesis of carbon nanotubes by microwave plasma-enhanced chemical vapor deposition
    Choi, YC
    Bae, DJ
    Lee, YH
    Lee, BS
    Han, IT
    Choi, WB
    Lee, NS
    Kim, JM
    SYNTHETIC METALS, 2000, 108 (02) : 159 - 163
  • [36] Low-temperature plasma-enhanced chemical vapor deposition of hard carbon films
    Vinogradov, AY
    Abramov, AS
    Orlov, KE
    Smirnov, AS
    VACUUM, 2004, 73 (01) : 131 - 135
  • [37] Dendrimer-assisted low-temperature growth of carbon nanotubes by plasma-enhanced chemical vapor deposition
    Amama, Placidus B.
    Ogebule, Oluwaseyi
    Maschmann, Matthew R.
    Sands, Timothy D.
    Fisher, Timothy S.
    CHEMICAL COMMUNICATIONS, 2006, (27) : 2899 - 2901
  • [38] Low-temperature growth of carbon nanotubes by grid-inserted plasma-enhanced chemical vapor deposition
    Kojima, Yoshihiro
    Kishimoto, Shigeru
    Mizutani, Takashi
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (12): : 8000 - 8002
  • [39] Growth of carbon nanofibers and related structures by combined method of plasma enhanced chemical vapor deposition and aerosol synthesis
    Gulas, Michal
    Caplovicova, Maria
    Michalka, Miroslav
    Le Normand, Francois
    Ravar, Marius
    Macko, Peter
    Veis, Pavel
    VACUUM, 2008, 82 (08) : 805 - 813
  • [40] Electrical characterization of graphene films synthesized by low-temperature microwave plasma chemical vapor deposition
    Okigawa, Yuki
    Tsugawa, Kazuo
    Yamada, Takatoshi
    Ishihara, Masatou
    Hasegawa, Masataka
    APPLIED PHYSICS LETTERS, 2013, 103 (15)