Dendrimer-assisted low-temperature growth of carbon nanotubes by plasma-enhanced chemical vapor deposition

被引：24
|
作者：
Amama, Placidus B.
Ogebule, Oluwaseyi
Maschmann, Matthew R.
Sands, Timothy D.
Fisher, Timothy S.
机构：
[1] Purdue Univ, Birck Nanotechnol Ctr, W Lafayette, IN 47907 USA
[2] Alabama A&M Univ, Dept Chem, Normal, AL 35762 USA
[3] Purdue Univ, Sch Mech Engn, W Lafayette, IN 47907 USA
[4] Purdue Univ, Sch Mat Engn, Sch Elect & Comp Engn, W Lafayette, IN 47907 USA
来源：
CHEMICAL COMMUNICATIONS | 2006年 / 27期
关键词：
D O I：
10.1039/b602623k
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Using a shielded growth approach and N-2-annealed, nearly monodispersed Fe2O3 nanoparticles synthesized by interdendritic stabilization of Fe3+ species within fourth-generation poly( amidoamine) dendrimers, carbon nanotubes and nanofibers were successfully grown at low substrate temperatures (200-400 degrees C) by microwave plasma-enhanced chemical vapor deposition.
引用
收藏
页码：2899 / 2901
页数：3
相关论文
共 50 条
  • [1] Low-temperature growth of carbon nanotubes by plasma-enhanced chemical vapor deposition
    Hofmann, S
    Ducati, C
    Robertson, J
    Kleinsorge, B
    [J]. APPLIED PHYSICS LETTERS, 2003, 83 (01) : 135 - 137
  • [2] Dendrimer-assisted low-temperature growth of carbon nanotubes by PECVD
    Amama, Placidus B.
    Ogebule, Oluwaseyi
    Maschmann, Matthew R.
    Sands, Timothy D.
    Fisher, Timothy S.
    [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2006, 231
  • [3] Dendrimer-assisted low-temperature growth of carbon nanotubes by PECVD
    Amama, Placidus B.
    Ogebule, Oluwaseyi
    Maschmann, Matthew R.
    Sands, Timothy D.
    Fisher, Timothy S.
    [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2006, 231
  • [4] Low-temperature growth of carbon nanotubes by grid-inserted plasma-enhanced chemical vapor deposition
    Kojima, Yoshihiro
    Kishimoto, Shigeru
    Mizutani, Takashi
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (12): : 8000 - 8002
  • [5] Growth of carbon nanotubes by microwave plasma-enhanced chemical vapor deposition at low temperature
    Choi, YC
    Bae, DJ
    Lee, YH
    Lee, BS
    Park, GS
    Choi, WB
    Lee, NS
    Kim, JM
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2000, 18 (04): : 1864 - 1868
  • [6] Growth of carbon nanotubes by plasma-enhanced chemical vapor deposition
    Sato, Hideki
    Hata, Koichi
    [J]. NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY, 2006, 16 (03): : 163 - 176
  • [7] Low-temperature plasma-enhanced chemical vapor deposition of hard carbon films
    Vinogradov, AY
    Abramov, AS
    Orlov, KE
    Smirnov, AS
    [J]. VACUUM, 2004, 73 (01) : 131 - 135
  • [8] Low temperature synthesis of carbon nanotubes by microwave plasma-enhanced chemical vapor deposition
    Choi, YC
    Bae, DJ
    Lee, YH
    Lee, BS
    Han, IT
    Choi, WB
    Lee, NS
    Kim, JM
    [J]. SYNTHETIC METALS, 2000, 108 (02) : 159 - 163
  • [9] Carbon nanotubes by plasma-enhanced chemical vapor deposition
    Bell, Martin S.
    Teo, Kenneth B. K.
    Lacerda, Rodrigo G.
    Milne, W. I.
    Hash, David B.
    Meyyappan, M.
    [J]. PURE AND APPLIED CHEMISTRY, 2006, 78 (06) : 1117 - 1125
  • [10] Low-temperature growth of carbon nanotube by plasma-enhanced chemical vapor deposition using nickel catalyst
    Ryu, KM
    Kang, MY
    Kim, YD
    Jeon, HT
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2003, 42 (6A): : 3578 - 3581
12345