Fourier analysis of line-edge roughness in calixarene fine patterns

被引：2
|
作者：
Ishida, M [1 ]
Fujita, J [1 ]
Ochiai, Y [1 ]
Yamamoto, H [1 ]
Touno, S [1 ]
机构：
[1] NEC Corp Ltd, Fundamental Res Labs, Tsukuba, Ibaraki 3058501, Japan
来源：
MICROPROCESSES AND NANOTECHNOLOGY 2001, DIGEST OF PAPERS | 2001年
关键词：
D O I：
10.1109/IMNC.2001.984196
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：276 / 277
页数：2
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