Fourier analysis of line-edge roughness in calixarene fine patterns

被引：2
|
作者：
Ishida, M [1 ]
Fujita, J [1 ]
Ochiai, Y [1 ]
Yamamoto, H [1 ]
Touno, S [1 ]
机构：
[1] NEC Corp Ltd, Fundamental Res Labs, Tsukuba, Ibaraki 3058501, Japan
来源：
MICROPROCESSES AND NANOTECHNOLOGY 2001, DIGEST OF PAPERS | 2001年
关键词：
D O I：
10.1109/IMNC.2001.984196
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：276 / 277
页数：2
相关论文
共 50 条
  • [31] Mask-roughness-induced line-edge roughness: rule of thumb
    McClinton, Brittany M.
    Naulleau, Patrick P.
    [J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2010, 9 (04):
  • [32] Line-Edge Roughness performance targets for EUV Lithography
    Brunner, Timothy A.
    Chen, Xuemei
    Gabor, Allen
    Higgins, Craig
    Sun, Lei
    Mack, Chris A.
    [J]. EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VIII, 2017, 10143
  • [33] Resist materials providing small line-edge roughness
    Namatsu, H
    Yamaguchi, T
    Kurihara, K
    [J]. MATERIALS ISSUES AND MODELING FOR DEVICE NANOFABRICATION, 2000, 584 : 135 - 146
  • [34] Global minimization line-edge roughness analysis of top down SEM images
    Lane, Barton
    Mack, Chris
    Eibagi, Nasim
    Ventzek, Peter
    [J]. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXI, 2017, 10145
  • [35] Image-pixel averaging for accurate analysis of line-edge and linewidth roughness
    Hiraiwa, Atsushi
    Nishida, Akio
    [J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2011, 10 (02):
  • [36] Material origins of line-edge roughness: Monte Carlo simulations and scaling analysis
    Patsis, GP
    Constantoudis, V
    Gogolides, E
    [J]. ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXI, PTS 1 AND 2, 2004, 5376 : 773 - 781
  • [37] Power Spectrum of Smoothed Line-Edge and Line-Width Roughness
    Hiraiwa, Atsushi
    Nishida, Akio
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (08)
  • [38] Photo-resist line-edge roughness analysis using scaling concepts
    Constantoudis, V
    Patsis, GP
    Gogolides, E
    [J]. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVII, PTS 1 AND 2, 2003, 5038 : 901 - 909
  • [39] Measurement of sidewall, line and line-edge roughness with scanning probe microscopy
    Walch, K
    Meyyappan, A
    Muckenhirn, S
    Margail, J
    [J]. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XV, 2001, 4344 : 726 - 732
  • [40] Simulation of material and processing effects on photoresist line-edge roughness
    Patsis, G. P.
    Nijkerk, M. D.
    Leunissen, L. H. A.
    Gogolides, E.
    [J]. INTERNATIONAL JOURNAL OF COMPUTATIONAL SCIENCE AND ENGINEERING, 2006, 2 (3-4) : 134 - 143
12345