Material origins of line-edge roughness: Monte Carlo simulations and scaling analysis

被引：1
|
作者：
Patsis, GP [1 ]
Constantoudis, V [1 ]
Gogolides, E [1 ]
机构：
[1] NCSR Demokritos, Inst Microelect, Athens 15310, Greece
来源：
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXI, PTS 1 AND 2 | 2004年 / 5376卷
关键词：
D O I：
10.1117/12.535202
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A fast 2D/3D resist dissolution algorithm is used to quantify line-edge roughness and determine its relation to resist material parameters, such as the polymerization length distribution, the end-to-end distance and the radius of gyration, along with the effects of acid-diffusion. The same relation between surface roughness and exposure dose known to hold experimentally is also shown to be valid for line-edge roughness. Increasing average polymerization length results in increased values of line-edge roughness, radius of gyration and end-to-end distance establishing an immediate relation between material properties and measured line-edge roughness (LER). The effects of the edge depth and length of measurement and of the free volume on LER vs. are also investigated.
引用
收藏
页码：773 / 781
页数：9
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