Interfacial Engineering of Semiconductor-Superconductor Junctions for High Performance Micro-Coolers

被引:12
|
作者
Gunnarsson, D. [1 ]
Richardson-Bullock, J. S. [2 ]
Prest, M. J. [2 ]
H. Q. Nguyen [3 ]
Timofeev, A. V. [1 ]
Shah, V. A. [2 ]
Whall, T. E. [2 ]
Parker, E. H. C. [2 ]
Leadley, D. R. [2 ]
Myronov, M. [2 ]
Prunnila, M. [1 ]
机构
[1] VTT Tech Res Ctr Finland, FI-02044 Espoo, Finland
[2] Univ Warwick, Dept Phys, Coventry CV4 7AL, W Midlands, England
[3] Aalto Univ Sch Sci, Low Temp Lab OVLL, FI-00076 Aalto, Finland
来源
SCIENTIFIC REPORTS | 2015年 / 5卷
基金
英国工程与自然科学研究理事会; 芬兰科学院;
关键词
SCHOTTKY-BARRIER; DOPED SILICON; REFRIGERATION; THERMOMETRY;
D O I
10.1038/srep17398
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
The control of electronic and thermal transport through material interfaces is crucial for numerous micro and nanoelectronics applications and quantum devices. Here we report on the engineering of the electro-thermal properties of semiconductor-superconductor (Sm-S) electronic cooler junctions by a nanoscale insulating tunnel barrier introduced between the Sm and S electrodes. Unexpectedly, such an interface barrier does not increase the junction resistance but strongly reduces the detrimental sub-gap leakage current. These features are key to achieving high cooling power tunnel junction refrigerators, and we demonstrate unparalleled performance in silicon-based Sm-S electron cooler devices with orders of magnitudes improvement in the cooling power in comparison to previous works. By adapting the junctions in strain-engineered silicon coolers we also demonstrate efficient electron temperature reduction from 300 mK to below 100 mK. Investigations on junctions with different interface quality indicate that the previously unexplained sub-gap leakage current is strongly influenced by the Sm-S interface states. These states often dictate the junction electrical resistance through the well-known Fermi level pinning effect and, therefore, superconductivity could be generally used to probe and optimize metal-semiconductor contact behaviour.
引用
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页数:10
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