Simulation of plasma-based ion implantation of a sawtooth target

被引：7
|
作者：
Sheridan, TE
机构：
[1] Department of Physics, West Virginia University, Morgantown
来源：
SURFACE & COATINGS TECHNOLOGY | 1997年 / 93卷 / 2-3期
关键词：
plasma-based ion implantation; sheath; sawtooth; plasma simulation;
D O I：
10.1016/S0257-8972(97)00049-2
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Plasma-based ion implantation of a two-dimensional target consisting of a periodic array of symmetric, 90 degrees, triangular sawteeth is studied using a particle-in-cell plasma simulation. The average ion flux, ion impact angle, ion impact energy and the energy-resolved dose are computed. When the sheath width is large compared to the tooth size, the sheath edge becomes planar, the ion flux is nearly uniform and ions impact the surface of the target at approximate to 45 degrees. The incident dose is greatest near the convex corner, and least in the concave corner. (C) 1997 Elsevier Science S.A.
引用
收藏
页码：225 / 228
页数：4
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