SiC/GaN power semiconductor devices: a theoretical comparison and experimental evaluation under different switching conditions

被引:33
|
作者
Li, Ke [1 ]
Evans, Paul [1 ]
Johnson, Mark [1 ]
机构
[1] Univ Nottingham, Power Elect Machine & Control Grp, Nottingham, England
基金
英国工程与自然科学研究理事会;
关键词
D O I
10.1049/iet-est.2017.0022
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
(This study is for special section Design, modelling and control of electric drives for transportation applications') The conduction and switching losses of silicon carbide (SIC) and gallium nitride (GaN) power transistors are compared in this study. Voltage rating of commercial GaN power transistors is <650V, whereas that of SiC power transistors is <1200V. This study begins with a theoretical analysis that examines how the characteristics of a 1200V SiC metal-oxide-semiconductor field-effect transistor (MOSFET) change if device design is re-optimised for 600V blocking voltage. Afterwards, a range of commercial devices [1200V SIC junction gate FET, 1200V SiCMOSFET, 650V SiC-MOSFET and 650V GaN high-electron-mobility transistor (HEMT)] with the same current rating are characterised and their conduction losses, inter-electrode capacitances and switching energy E-sw are compared, where it is shown that GaN-HEMT has smaller conduction and switching losses than SiC devices. Finally, a zero-voltage switching circuit is used to evaluate all the devices, where device only produces turn-OFF switching losses and it is shown that GaN-HEMT has less switching losses than SiC device in this soft switching mode. It is also shown in this study that 1200V SiC-MOSFET has smaller conduction and switching losses than 650V SiC-MOSFET.
引用
收藏
页码:3 / 11
页数:9
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