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- [41] Highly Stable Epitaxially Crystallized Ferroelectric Hf0.5Zr0.5O2 FilmsACS APPLIED ELECTRONIC MATERIALS, 2023, 5 (11) : 6142 - 6148Lyu, Xueliang论文数: 0 引用数: 0 h-index: 0机构: Inst Ciencia Mat Barcelona ICMAB, CSIC, Bellaterra 08193, Barcelona, Spain Inst Ciencia Mat Barcelona ICMAB, CSIC, Bellaterra 08193, Barcelona, SpainSong, Tingfeng论文数: 0 引用数: 0 h-index: 0机构: Inst Ciencia Mat Barcelona ICMAB, CSIC, Bellaterra 08193, Barcelona, Spain Inst Ciencia Mat Barcelona ICMAB, CSIC, Bellaterra 08193, Barcelona, SpainQuintana, Alberto论文数: 0 引用数: 0 h-index: 0机构: Inst Ciencia Mat Barcelona ICMAB, CSIC, Bellaterra 08193, Barcelona, Spain Inst Ciencia Mat Barcelona ICMAB, CSIC, Bellaterra 08193, Barcelona, SpainFina, Ignasi论文数: 0 引用数: 0 h-index: 0机构: Inst Ciencia Mat Barcelona ICMAB, CSIC, Bellaterra 08193, Barcelona, Spain Inst Ciencia Mat Barcelona ICMAB, CSIC, Bellaterra 08193, Barcelona, SpainSanchez, Florencio论文数: 0 引用数: 0 h-index: 0机构: Inst Ciencia Mat Barcelona ICMAB, CSIC, Bellaterra 08193, Barcelona, Spain Inst Ciencia Mat Barcelona ICMAB, CSIC, Bellaterra 08193, Barcelona, Spain
- [43] Leakage currents mechanism in thin films of ferroelectric Hf0.5Zr0.5O233RD INTERNATIONAL CONFERENCE ON THE PHYSICS OF SEMICONDUCTORS, 2017, 864Islamov, Damir R.论文数: 0 引用数: 0 h-index: 0机构: Rzhanov Inst Semicond Phys SB RAS, Novosibirsk 630090, Russia Novosibirsk State Univ, Novosibirsk 630090, Russia Rzhanov Inst Semicond Phys SB RAS, Novosibirsk 630090, RussiaChernikova, A. G.论文数: 0 引用数: 0 h-index: 0机构: Moscow Inst Phys & Technol, Dolgoprudnyi 141700, Russia Rzhanov Inst Semicond Phys SB RAS, Novosibirsk 630090, RussiaKozodaev, M. G.论文数: 0 引用数: 0 h-index: 0机构: Moscow Inst Phys & Technol, Dolgoprudnyi 141700, Russia Rzhanov Inst Semicond Phys SB RAS, Novosibirsk 630090, RussiaMarkeev, A. M.论文数: 0 引用数: 0 h-index: 0机构: Moscow Inst Phys & Technol, Dolgoprudnyi 141700, Russia Rzhanov Inst Semicond Phys SB RAS, Novosibirsk 630090, RussiaPerevalov, T. V.论文数: 0 引用数: 0 h-index: 0机构: Rzhanov Inst Semicond Phys SB RAS, Novosibirsk 630090, Russia Novosibirsk State Univ, Novosibirsk 630090, Russia Rzhanov Inst Semicond Phys SB RAS, Novosibirsk 630090, RussiaGritsenko, V. A.论文数: 0 引用数: 0 h-index: 0机构: Rzhanov Inst Semicond Phys SB RAS, Novosibirsk 630090, Russia Novosibirsk State Univ, Novosibirsk 630090, Russia Rzhanov Inst Semicond Phys SB RAS, Novosibirsk 630090, RussiaOrlov, O. M.论文数: 0 引用数: 0 h-index: 0机构: JSC Mol Elect Res Inst, Moscow 124460, Russia Rzhanov Inst Semicond Phys SB RAS, Novosibirsk 630090, Russia
- [44] Electrically induced cancellation and inversion of piezoelectricity in ferroelectric Hf0.5Zr0.5O2Nature Communications, 15Haidong Lu论文数: 0 引用数: 0 h-index: 0机构: University of Nebraska-Lincoln,Department of Physics and AstronomyDong-Jik Kim论文数: 0 引用数: 0 h-index: 0机构: University of Nebraska-Lincoln,Department of Physics and AstronomyHugo Aramberri论文数: 0 引用数: 0 h-index: 0机构: University of Nebraska-Lincoln,Department of Physics and AstronomyMarco Holzer论文数: 0 引用数: 0 h-index: 0机构: University of Nebraska-Lincoln,Department of Physics and AstronomyPratyush Buragohain论文数: 0 引用数: 0 h-index: 0机构: University of Nebraska-Lincoln,Department of Physics and AstronomySangita Dutta论文数: 0 引用数: 0 h-index: 0机构: University of Nebraska-Lincoln,Department of Physics and AstronomyUwe Schroeder论文数: 0 引用数: 0 h-index: 0机构: University of Nebraska-Lincoln,Department of Physics and AstronomyVeeresh Deshpande论文数: 0 引用数: 0 h-index: 0机构: University of Nebraska-Lincoln,Department of Physics and AstronomyJorge Íñiguez论文数: 0 引用数: 0 h-index: 0机构: University of Nebraska-Lincoln,Department of Physics and AstronomyAlexei Gruverman论文数: 0 引用数: 0 h-index: 0机构: University of Nebraska-Lincoln,Department of Physics and AstronomyCatherine Dubourdieu论文数: 0 引用数: 0 h-index: 0机构: University of Nebraska-Lincoln,Department of Physics and Astronomy
- [45] Epitaxial Ferroelectric Hf0.5Zr0.5O2 with Metallic Pyrochlore Oxide ElectrodesADVANCED MATERIALS, 2021, 33 (10)Zhang, Zimeng论文数: 0 引用数: 0 h-index: 0机构: Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USAHsu, Shang-Lin论文数: 0 引用数: 0 h-index: 0机构: Natl Ctr Electron Microscopy, Mol Foundry, Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA Univ Calif Berkeley, Dept Elect Engn & Comp Sci, Berkeley, CA 94720 USA Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USAStoica, Vladimir A.论文数: 0 引用数: 0 h-index: 0机构: Argonne Natl Lab, Adv Photon Source, Lemont, IL 60439 USA Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA论文数: 引用数: h-index:机构:Parsonnet, Eric论文数: 0 引用数: 0 h-index: 0机构: Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USAQualls, Alexander论文数: 0 引用数: 0 h-index: 0机构: Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USAWang, Jianjun论文数: 0 引用数: 0 h-index: 0机构: Penn State Univ, Dept Mat Sci & Engn, University Pk, PA 16802 USA Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USAXie, Liang论文数: 0 引用数: 0 h-index: 0机构: Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USAKumari, Mukesh论文数: 0 引用数: 0 h-index: 0机构: Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USADas, Sujit论文数: 0 引用数: 0 h-index: 0机构: Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USALeng, Zhinan论文数: 0 引用数: 0 h-index: 0机构: Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USAMcBriarty, Martin论文数: 0 引用数: 0 h-index: 0机构: EMD Performance Mat, San Jose, CA 95134 USA Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USAProksch, Roger论文数: 0 引用数: 0 h-index: 0机构: Asylum Res, Goleta, CA 93117 USA Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USAGruverman, Alexei论文数: 0 引用数: 0 h-index: 0机构: Univ Nebraska, Dept Phys, Lincoln, NE 68588 USA Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USASchlom, Darrell G.论文数: 0 引用数: 0 h-index: 0机构: Cornell Univ, Platform Accelerated Realizat Anal & Discovery In, Ithaca, NY 14853 USA Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA Kavli Inst Cornell Nanoscale Sci, Ithaca, NY 14853 USA Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USAChen, Long-Qing论文数: 0 引用数: 0 h-index: 0机构: Penn State Univ, Dept Mat Sci & Engn, University Pk, PA 16802 USA Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USASalahuddin, Sayeef论文数: 0 引用数: 0 h-index: 0机构: Univ Calif Berkeley, Dept Elect Engn & Comp Sci, Berkeley, CA 94720 USA Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USAMartin, Lane W.论文数: 0 引用数: 0 h-index: 0机构: Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA Lawrence Berkeley Natl Lab, Mat Sci Div, Berkeley, CA 94720 USA Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USARamesh, Ramamoorthy论文数: 0 引用数: 0 h-index: 0机构: Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA Univ Calif Berkeley, Dept Elect Engn & Comp Sci, Berkeley, CA 94720 USA Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
- [46] Leakage Currents Mechanism in Thin Films of Ferroelectric Hf0.5Zr0.5O2NONVOLATILE MEMORIES 5, 2017, 75 (32): : 123 - 129Islamov, D. R.论文数: 0 引用数: 0 h-index: 0机构: RAS, Rzhanov Inst Semicond Phys SB, Novosibirsk 630090, Russia Novosibirsk State Univ, Novosibirsk 630090, Russia RAS, Rzhanov Inst Semicond Phys SB, Novosibirsk 630090, RussiaChernikova, A. G.论文数: 0 引用数: 0 h-index: 0机构: Moscow Inst Phys & Technol, Dolgoprudnyi 141700, Russia RAS, Rzhanov Inst Semicond Phys SB, Novosibirsk 630090, RussiaKozodaev, M. G.论文数: 0 引用数: 0 h-index: 0机构: Moscow Inst Phys & Technol, Dolgoprudnyi 141700, Russia RAS, Rzhanov Inst Semicond Phys SB, Novosibirsk 630090, RussiaPerevalov, T. V.论文数: 0 引用数: 0 h-index: 0机构: RAS, Rzhanov Inst Semicond Phys SB, Novosibirsk 630090, Russia Novosibirsk State Univ, Novosibirsk 630090, Russia RAS, Rzhanov Inst Semicond Phys SB, Novosibirsk 630090, RussiaGritsenko, V. A.论文数: 0 引用数: 0 h-index: 0机构: RAS, Rzhanov Inst Semicond Phys SB, Novosibirsk 630090, Russia Novosibirsk State Univ, Novosibirsk 630090, Russia RAS, Rzhanov Inst Semicond Phys SB, Novosibirsk 630090, RussiaOrlov, O. M.论文数: 0 引用数: 0 h-index: 0机构: JSC Mol Elect Res Inst, Zelenograd 124460, Russia RAS, Rzhanov Inst Semicond Phys SB, Novosibirsk 630090, RussiaMarkeev, A. V.论文数: 0 引用数: 0 h-index: 0机构: Moscow Inst Phys & Technol, Dolgoprudnyi 141700, Russia RAS, Rzhanov Inst Semicond Phys SB, Novosibirsk 630090, Russia
- [47] Leakage mechanism in ferroelectric Hf0.5Zr0.5O2 epitaxial thin filmsAPPLIED MATERIALS TODAY, 2023, 32Cheng, Xianlong论文数: 0 引用数: 0 h-index: 0机构: Harbin Inst Technol, Sch Mat Sci & Engn, Shenzhen 518055, Guangdong, Peoples R China Harbin Inst Technol, Sch Mat Sci & Engn, Shenzhen 518055, Guangdong, Peoples R ChinaZhou, Chao论文数: 0 引用数: 0 h-index: 0机构: Harbin Inst Technol, Sch Mat Sci & Engn, Shenzhen 518055, Guangdong, Peoples R China Harbin Inst Technol, Sch Mat Sci & Engn, Shenzhen 518055, Guangdong, Peoples R ChinaLin, Baichen论文数: 0 引用数: 0 h-index: 0机构: Harbin Inst Technol, Sch Mat Sci & Engn, Shenzhen 518055, Guangdong, Peoples R China Harbin Inst Technol, Sch Mat Sci & Engn, Shenzhen 518055, Guangdong, Peoples R ChinaYang, Zhenni论文数: 0 引用数: 0 h-index: 0机构: Xiamen Univ, Coll Chem & Chem Engn, State Key Lab Phys Chem Solid Surfaces, Xiamen 361005, Peoples R China Harbin Inst Technol, Sch Mat Sci & Engn, Shenzhen 518055, Guangdong, Peoples R ChinaChen, Shanquan论文数: 0 引用数: 0 h-index: 0机构: Harbin Inst Technol, Sch Mat Sci & Engn, Shenzhen 518055, Guangdong, Peoples R China Harbin Inst Technol, Sch Mat Sci & Engn, Shenzhen 518055, Guangdong, Peoples R ChinaZhang, Kelvin H. L.论文数: 0 引用数: 0 h-index: 0机构: Xiamen Univ, Coll Chem & Chem Engn, State Key Lab Phys Chem Solid Surfaces, Xiamen 361005, Peoples R China Harbin Inst Technol, Sch Mat Sci & Engn, Shenzhen 518055, Guangdong, Peoples R ChinaChen, Zuhuang论文数: 0 引用数: 0 h-index: 0机构: Harbin Inst Technol, Sch Mat Sci & Engn, Shenzhen 518055, Guangdong, Peoples R China Harbin Inst Technol, Flexible Printed Elect Technol Ctr, Shenzhen 518055, Peoples R China Harbin Inst Technol, Sch Mat Sci & Engn, Shenzhen 518055, Guangdong, Peoples R China
- [48] Growth Window of Ferroelectric Epitaxial Hf0.5Zr0.5O2 Thin FilmsACS APPLIED ELECTRONIC MATERIALS, 2019, 1 (02): : 220 - 228Lyu, Jike论文数: 0 引用数: 0 h-index: 0机构: CSIC, ICMAB, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, Spain CSIC, ICMAB, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, SpainFina, Ignasi论文数: 0 引用数: 0 h-index: 0机构: CSIC, ICMAB, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, Spain CSIC, ICMAB, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, SpainSolanas, Raul论文数: 0 引用数: 0 h-index: 0机构: CSIC, ICMAB, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, Spain CSIC, ICMAB, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, SpainFontcuberta, Josep论文数: 0 引用数: 0 h-index: 0机构: CSIC, ICMAB, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, Spain CSIC, ICMAB, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, SpainSanchez, Florencio论文数: 0 引用数: 0 h-index: 0机构: CSIC, ICMAB, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, Spain CSIC, ICMAB, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, Spain
- [49] Engineering Ferroelectric Hf0.5Zr0.5O2 Thin Films by Epitaxial StressACS APPLIED ELECTRONIC MATERIALS, 2019, 1 (08) : 1449 - 1457Estandia, Saul论文数: 0 引用数: 0 h-index: 0机构: ICMAB CSIC, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, Spain ICMAB CSIC, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, SpainDix, Nico论文数: 0 引用数: 0 h-index: 0机构: ICMAB CSIC, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, Spain ICMAB CSIC, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, SpainGazquez, Jaume论文数: 0 引用数: 0 h-index: 0机构: ICMAB CSIC, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, Spain ICMAB CSIC, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, SpainFina, Ignasi论文数: 0 引用数: 0 h-index: 0机构: ICMAB CSIC, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, Spain ICMAB CSIC, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, SpainLyu, Jike论文数: 0 引用数: 0 h-index: 0机构: ICMAB CSIC, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, Spain ICMAB CSIC, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, SpainChisholm, Matthew F.论文数: 0 引用数: 0 h-index: 0机构: Oak Ridge Natl Lab, Ctr Nanophase Mat Sci, Oak Ridge, TN 37831 USA ICMAB CSIC, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, SpainFontcuberta, Josep论文数: 0 引用数: 0 h-index: 0机构: ICMAB CSIC, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, Spain ICMAB CSIC, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, SpainSanchez, Florencio论文数: 0 引用数: 0 h-index: 0机构: ICMAB CSIC, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, Spain ICMAB CSIC, Inst Ciencia Mat Barcelona, Campus UAB, Barcelona 08193, Spain
- [50] Oxygen vacancy distribution and phase composition in scaled, Hf0.5Zr0.5O2-based ferroelectric capacitorsAPPLIED PHYSICS LETTERS, 2025, 126 (06)Iung, T.论文数: 0 引用数: 0 h-index: 0机构: Univ Paris Saclay, SPEC, CEA, CNRS,CEA Saclay, F-91191 Gif Sur Yvette, France STMicroelect, 850 Rue Jean Monnet, F-38920 Crolles, France Univ Paris Saclay, SPEC, CEA, CNRS,CEA Saclay, F-91191 Gif Sur Yvette, FranceRamirez, L. Perez论文数: 0 引用数: 0 h-index: 0机构: Univ Paris Saclay, SPEC, CEA, CNRS,CEA Saclay, F-91191 Gif Sur Yvette, France Univ Paris Saclay, SPEC, CEA, CNRS,CEA Saclay, F-91191 Gif Sur Yvette, FranceGloskovskii, A.论文数: 0 引用数: 0 h-index: 0机构: DESY, Notkestr 85, D-22607 Hamburg, Germany Univ Paris Saclay, SPEC, CEA, CNRS,CEA Saclay, F-91191 Gif Sur Yvette, FranceCho, C. -Yi论文数: 0 引用数: 0 h-index: 0机构: Natl Yang Ming Chiao Tung Univ, Hsinchu 300, Taiwan Univ Paris Saclay, SPEC, CEA, CNRS,CEA Saclay, F-91191 Gif Sur Yvette, FranceLao, M. -Y论文数: 0 引用数: 0 h-index: 0机构: Natl Yang Ming Chiao Tung Univ, Hsinchu 300, Taiwan Univ Paris Saclay, SPEC, CEA, CNRS,CEA Saclay, F-91191 Gif Sur Yvette, FranceDe, S.论文数: 0 引用数: 0 h-index: 0机构: Natl Yang Ming Chiao Tung Univ, Hsinchu 300, Taiwan Natl Tsing Hua Univ, Coll Semicond Res, Hsinchu, Taiwan Univ Paris Saclay, SPEC, CEA, CNRS,CEA Saclay, F-91191 Gif Sur Yvette, FranceHou, T. -h论文数: 0 引用数: 0 h-index: 0机构: Natl Yang Ming Chiao Tung Univ, Hsinchu 300, Taiwan Univ Paris Saclay, SPEC, CEA, CNRS,CEA Saclay, F-91191 Gif Sur Yvette, FranceLubin, C.论文数: 0 引用数: 0 h-index: 0机构: Univ Paris Saclay, SPEC, CEA, CNRS,CEA Saclay, F-91191 Gif Sur Yvette, France Univ Paris Saclay, SPEC, CEA, CNRS,CEA Saclay, F-91191 Gif Sur Yvette, FranceGros-Jean, M.论文数: 0 引用数: 0 h-index: 0机构: STMicroelect, 850 Rue Jean Monnet, F-38920 Crolles, France Univ Paris Saclay, SPEC, CEA, CNRS,CEA Saclay, F-91191 Gif Sur Yvette, France论文数: 引用数: h-index:机构: