Peculiarity of depletion region in diamond pn-junction

被引:13
|
作者
Koide, Y [1 ]
机构
[1] Natl Inst Mat Sci, Adv Mat Lab, Tsukuba, Ibaraki 3050044, Japan
关键词
diamond; pn-junction; phosphorus donor; boron acceptor; deep dopant; carrier profile; space-charge layer; depletion layer; bipolar transistor;
D O I
10.1143/JJAP.42.6800
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ionized dopant and carrier profiles in the pn-junction of diamond with a deep phosphorus donor and a boron acceptor are theoretically analyzed by simply solving a one-dimensional Poisson equation. The width of the depletion layer is around two times larger than that of the space-charge layer since there exists a transition region at the depletion layer edge. The difference between these widths is reduced with increasing temperature. It is predicted that the static saturation property of a bipolar pnp-junction transistor is affected by the large width of the depletion layer. A base donor density higher than high-10(18) cm(-3) is required for an acceptor density of 1 x 10(18) cm(-3) in the collector to obtain an Early voltage larger than 100V. Similarly, a punch-through voltage is extremely reduced by the deep dopant effect. However, the deep dopant effect is weakened with increasing temperature.
引用
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页码:6800 / 6803
页数:4
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