Fluorinated chemically amplified dissolution inhibitors for 157 nm nanolithography

被引：8
|
作者：
Fresco, ZM [1 ]
Bensel, N [1 ]
Suez, I [1 ]
Backer, SA [1 ]
Fréchet, JMJ [1 ]
Conley, W [1 ]
机构：
[1] Univ Calif Berkeley, Dept Chem, Berkeley, CA 94720 USA
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2003年 / 16卷 / 01期
关键词：
dissolution inhibitor; 157; nm; QCM; hexafluoroalcohol;
D O I：
10.2494/photopolymer.16.27
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
We present the synthesis and screening of a series of new fluorinated materials designed to act as chemically amplified dissolution inhibitors for 157 nm lithography. Dissolution rates measured using a quartz crystal microbalance apparatus on a variety of matrix polymers as well as initial results demonstrating the imageability of this multi-component system are described.
引用
收藏
页码：27 / 35
页数：9
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