共 50 条
- [1] Dissolution inhibitors for 193-nm chemically amplified resists JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (12B): : 7625 - 7631
- [2] Dissolution characteristics of chemically amplified 193 nm resists JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3726 - 3729
- [3] Environmental stability of 193-nm single layer chemically amplified resists NEC Res Dev, 3 (345-349):
- [4] Environmental stability of 193-nm single layer chemically amplified resists NEC RESEARCH & DEVELOPMENT, 1999, 40 (03): : 345 - 349
- [5] Non-chemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVII, PTS 1 AND 2, 2010, 7639
- [7] Effects of polymer structure oil dissolution characteristics in chemically amplified 193nm resists MICROLITHOGRAPHY 1999: ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVI, PTS 1 AND 2, 1999, 3678 : 306 - 315
- [8] Non-chemically amplified resists for 193 nm lithography ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXV, PTS 1 AND 2, 2008, 6923
- [9] Advanced materials for 193-nm resists ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVII, PTS 1 AND 2, 2000, 3999 : 1147 - 1156