Read/write margin enhanced 10T SRAM for low voltage application

被引:5
|
作者
Peng, Chunyu [1 ]
Guan, Lijun [1 ]
Lu, Wenjuan [1 ]
Wu, Xiulong [1 ]
Ji, Xincun [2 ]
机构
[1] Anhui Univ, Sch Elect & Informat Engn, Hefei 230601, Peoples R China
[2] Nanjing Univ Posts & Telecommun, Coll Elect Sci & Engn, Nanjing 210001, Jiangsu, Peoples R China
来源
IEICE ELECTRONICS EXPRESS | 2016年 / 13卷 / 12期
基金
中国国家自然科学基金;
关键词
SRAM; low voltage; SNM; VDDmin; process variations; failure probability; CELL; ROBUST;
D O I
10.1587/elex.13.20160382
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The static random access memory (SRAM) is indispensable for high performance applications. With technology scaling, the device size as well as the operation supply voltage (VDD) is reduced. However, with the supply voltage decreasing, the performance of the conventional 6T SRAM is deteriorated seriously. In this letter, a symmetrical 10T SRAM with dramatically improved read stability and write ability is proposed. The simulation results indicate that, compared with the conventional 6T SRAM, the read static noise margin (RSNM) and write margin (WM) of the proposed 10T SRAM achieve 2.43x and 4.51x improvement, respectively, at a 0.8V supply voltage in SMIC 65 nm technology. As a result, lower failure probability in access operations is expected. Moreover, the minimum supply voltage (VDDmin) of the proposed 10T SRAM achieves similar to 0.32x compared with that of conventional 6T cell. Additionally, it also shows a better tolerance to the varying process variations.
引用
收藏
页数:10
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