Theoretical investigation of inductively coupled CF4 discharges

A theoretical study is made of the effects of process conditions, such as the wave frequency, the gas pressure and the magnetic field, on inductively coupled CF4 discharges. A 0-dimensional model and Fokker-Planck approach are utilized for the investigation. Complex reactions involved in the CF4 discharges and non-local electron heating effects in the inductive discharges are considered in the calculation. The consequences of variations in the external parameter for radical formation and electron heating characteristics are analyzed. The radical composition affecting etching selectivity is shown to be dominantly governed by the absorbed power, and the low energy electron heating is shown to be enhanced in collisional region.