ELECTRICAL AND PLASMA CHARACTERISTICS OF 150 kHz BAND HIGH-POWER BURST INDUCTIVELY COUPLED PLASMA

被引：0

作者：

Shibata, K. ^{[1
]}

Konno, S. ^{[1
]}

Takahashi, K. ^{[1
]}

Mukaigawa, S. ^{[1
]}

Takaki, K. ^{[1
]}

Yukimura, K. ^{[1
]}

机构：

[1] Iwate Univ, Ueda 4-3-5, Morioka, Iwate 0208551, Japan

来源：

2017 IEEE 21ST INTERNATIONAL CONFERENCE ON PULSED POWER (PPC) | 2017年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Plasma source of an inductively coupled plasma (ICP) driven by high voltage burst pulse has been developed. A 200 mu s wide burst of 157 kHz power supply was used to produce plasma with repetition rate of 1 Hz. The electrical and plasma parameters are obtained based on mutual induction circuit model by analyzing waveforms of the coil current and the voltage. The plasma density was also obtained using a double probe measurement. The results showed that electrical power into plasma was obtained as 13.1 kW. The plasma density was obtained to be 10(19) m(-3) order by the equivalent circuit, which is good agreement with that obtained with probe measurement.

引用

页数：4

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