共 50 条
- [2] Negative ions in a pulsed-power inductively-coupled chlorine plasma for etching [J]. ICPP 96 CONTRIBUTED PAPERS - PROCEEDINGS OF THE 1996 INTERNATIONAL CONFERENCE ON PLASMA PHYSICS, VOLS 1 AND 2, 1997, : 1882 - 1885
- [3] Negative ion measurements and etching in a pulsed-power inductively coupled plasma in chlorine [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 1996, 5 (02): : 139 - 144
- [6] INDUCTIVELY COUPLED PLASMA AXIAL VIEWING ABSORPTION TECHNIQUE [J]. ANALYTICAL CHEMISTRY, 1990, 62 (13) : 1239 - 1241
- [9] CHARACTERISTICS OF INDUCTIVELY COUPLED PLASMA IN DIFFERENT POWER AND PRESSURE [J]. 2017 IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE (ICOPS), 2017,