Performance of 1 kHz KrF excimer laser for DUV lithography

被引：0
|
作者：
Das, P
Morton, R
Fomenkov, I
Partlo, B
Sandstrom, R
Maley, C
Cybulski, R
机构：
来源：
XI INTERNATIONAL SYMPOSIUM ON GAS FLOW AND CHEMICAL LASERS AND HIGH-POWER LASER CONFERENCE | 1997年 / 3092卷
关键词：
KrF lasers; deep Ultraviolet photolithography; SCR switched pulsed power;
D O I：
10.1117/12.270109
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
In response to the requirement for higher wafer throughput and increased dosage accuracy in DUV lithography steppers and scanners, Cymer has developed a 1kHz KrF laser optimized for this application. We shall describe its performance and design features.
引用
收藏
页码：467 / 470
页数：4
相关论文
共 50 条
  • [31] Fabrication of 0.2 mu m hole patterns in KrF excimer laser lithography
    Asano, M
    Kawano, K
    Tanaka, S
    Onishi, Y
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (5A): : 2640 - 2641
  • [32] NEW NEGATIVE DEEP-UV RESIST FOR KRF EXCIMER LASER LITHOGRAPHY
    ENDO, M
    TANI, Y
    SASAGO, M
    NOMURA, N
    [J]. POLYMERS IN MICROLITHOGRAPHY: MATERIALS AND PROCESSES, 1989, 412 : 269 - 279
  • [33] Monolayer halftone phase-shifting mask for KrF excimer laser lithography
    [J]. Iwabuchi, Yohko, 1600, (32):
  • [34] POSITIVE AND NEGATIVE CHEMICAL AMPLIFICATION RESIST SYSTEMS FOR KRF EXCIMER LASER LITHOGRAPHY
    HAYASHI, N
    UENO, T
    SHIRAISHI, H
    SCHLEGEL, L
    IWAYANAGI, T
    [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1991, 201 : 30 - PMSE
  • [35] PERFORMANCE OF 0.2 MU-M OPTICAL LITHOGRAPHY USING KRF AND ARF EXCIMER-LASER SOURCES
    YAMASHITA, K
    ENDO, M
    SASAGO, M
    NOMURA, N
    NAGANO, H
    MIZUGUCHI, S
    ONO, T
    SATO, T
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2692 - 2696
  • [36] Optical performance of KrF excimer laser lithography with phase shift mask for fabrication of 0.15 mu m and below
    Terasawa, T
    Imai, A
    Fukuda, H
    Ueno, T
    Okazaki, S
    [J]. INTERNATIONAL JOURNAL OF THE JAPAN SOCIETY FOR PRECISION ENGINEERING, 1995, 29 (03): : 229 - 234
  • [37] Performance of a highly stable 2 kHz operation KrF laser
    Enami, T
    Nakano, M
    Watanabe, T
    Ohbu, A
    Hori, T
    Ito, T
    Nishisaka, T
    Sumitani, A
    Wakabayashi, O
    Mizoguchi, H
    Nakarai, H
    Hisanaga, N
    Matsunaga, T
    Tanaka, H
    Ariga, T
    Sakanishi, S
    Okamoto, T
    Noudomi, R
    Suzuki, T
    Takabayashi, Y
    Tomaru, H
    Nakao, K
    [J]. OPTICAL MICROLITHOGRAPHY XII, PTS 1 AND 2, 1999, 3679 : 1076 - 1084
  • [38] High repetition rate excimer lasers for DUV lithography
    Stamm, U
    Paetzel, R
    Bragin, I
    Berger, V
    Klaft, I
    Kleinschmidt, J
    Osmanov, R
    Schroeder, T
    Vogler, K
    Zschocke, W
    Basting, D
    [J]. OPTICAL MICROLITHOGRAPHY XII, PTS 1 AND 2, 1999, 3679 : 1050 - 1057
  • [39] NOVEL POSITIVE DEEP-UV RESIST FOR KRF-EXCIMER LASER LITHOGRAPHY
    ENDO, M
    TANI, Y
    SASAGO, M
    OGAWA, K
    NOMURA, N
    [J]. POLYMER ENGINEERING AND SCIENCE, 1989, 29 (13): : 859 - 862
  • [40] APPLICATION OF PHOTOBLEACHABLE POSITIVE RESIST AND CONTRAST ENHANCEMENT MATERIAL TO KRF EXCIMER LASER LITHOGRAPHY
    ENDO, M
    TANI, Y
    SASAGO, M
    NOMURA, N
    DAS, S
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (11): : 2357 - 2361
12345