Performance of 1 kHz KrF excimer laser for DUV lithography

被引：0
|
作者：
Das, P
Morton, R
Fomenkov, I
Partlo, B
Sandstrom, R
Maley, C
Cybulski, R
机构：
来源：
XI INTERNATIONAL SYMPOSIUM ON GAS FLOW AND CHEMICAL LASERS AND HIGH-POWER LASER CONFERENCE | 1997年 / 3092卷
关键词：
KrF lasers; deep Ultraviolet photolithography; SCR switched pulsed power;
D O I：
10.1117/12.270109
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
In response to the requirement for higher wafer throughput and increased dosage accuracy in DUV lithography steppers and scanners, Cymer has developed a 1kHz KrF laser optimized for this application. We shall describe its performance and design features.
引用
收藏
页码：467 / 470
页数：4
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