NOVEL POSITIVE DEEP-UV RESIST FOR KRF-EXCIMER LASER LITHOGRAPHY

被引：1
|
作者：
ENDO, M
TANI, Y
SASAGO, M
OGAWA, K
NOMURA, N
机构：
来源：
POLYMER ENGINEERING AND SCIENCE | 1989年 / 29卷 / 13期
关键词：
D O I：
10.1002/pen.760291306
中图分类号：
TQ [化学工业];
学科分类号：
0817 ;
摘要：
引用
收藏
页码：859 / 862
页数：4
相关论文
共 50 条
  • [1] NEW NEGATIVE DEEP-UV RESIST FOR KRF EXCIMER LASER LITHOGRAPHY
    ENDO, M
    TANI, Y
    SASAGO, M
    NOMURA, N
    [J]. ACS SYMPOSIUM SERIES, 1989, 412 : 269 - 279
  • [2] NEW NEGATIVE DEEP-UV RESIST FOR KRF EXCIMER LASER LITHOGRAPHY
    ENDO, M
    TANI, Y
    SASAGO, M
    NOMURA, N
    [J]. POLYMERS IN MICROLITHOGRAPHY: MATERIALS AND PROCESSES, 1989, 412 : 269 - 279
  • [3] A NEGATIVE RESIST FOR KRF-EXCIMER LASER LITHOGRAPHY
    TORIUMI, M
    HAYASHI, N
    HASHIMOTO, M
    NONOGAKI, S
    UENO, T
    IWAYANAGI, T
    [J]. POLYMER ENGINEERING AND SCIENCE, 1989, 29 (13): : 868 - 873
  • [4] A NOVEL POSITIVE RESIST FOR DEEP-UV LITHOGRAPHY
    YAMAOKA, T
    NISHIKI, M
    KOSEKI, K
    KOSHIBA, M
    [J]. POLYMER ENGINEERING AND SCIENCE, 1989, 29 (13): : 856 - 858
  • [5] Positive resist for KrF excimer laser lithography
    Park, SJ
    Kim, IH
    Kang, YJ
    Lee, H
    Lee, SH
    Choi, SJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (05): : 2108 - 2112
  • [6] NEW NEGATIVE DEEP UV RESIST FOR KRF EXCIMER LASER LITHOGRAPHY
    ENDO, M
    TANI, Y
    SASAGO, M
    NOMURA, N
    [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1989, 197 : 35 - PMSE
  • [7] A NEW POSITIVE RESIST FOR KRF EXCIMER LASER LITHOGRAPHY
    TANI, Y
    ENDO, M
    SASAGO, M
    OGAWA, K
    [J]. ADVANCES IN RESIST TECHNOLOGY AND PROCESSING VI, 1989, 1086 : 22 - 33
  • [8] A NEW PHOTOBLEACHABLE POSITIVE RESIST FOR KRF EXCIMER LASER LITHOGRAPHY
    ENDO, M
    TANI, Y
    SASAGO, M
    OGAWA, K
    NOMURA, N
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (11): : L2219 - L2222
  • [9] AZIDE-STYRENE RESIN NEGATIVE DEEP UV RESIST FOR KRF EXCIMER LASER LITHOGRAPHY
    ENDO, M
    TANI, Y
    SASAGO, M
    NOMURA, N
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (09) : 2615 - 2618
  • [10] ORTHO-NITROBENZYL ESTER BASED DEEP UV RESIST FOR KRF EXCIMER LASER LITHOGRAPHY
    ENDO, M
    TANI, Y
    SASAGO, M
    NOMURA, N
    [J]. POLYMER JOURNAL, 1989, 21 (08) : 603 - 607
12345