DICE: A beneficial short-channel effect in nanoscale double-gate MOSFETs

被引:1
|
作者
Chouksey, Siddharth [1 ]
Fossum, Jerry G. [1 ]
机构
[1] Univ Florida, Dept Elect & Comp Engn, Gainesville, FL 32611 USA
关键词
drain-induced barrier lowering (DIBL); FinFET physical compact model; short-channel effects; velocity overshoot;
D O I
10.1109/TED.2007.914835
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Physics-based compact modeling, supported by numerical simulations, is used to show the significance of "drain-induced charge enhancement" (DICE) in nanoscale double-gate (DG) MOSFETs. DICE, which is the strong-inversion counterpart of drain-induced barrier lowering (DIBL), is shown to significantly benefit drive current, without affecting the gate capacitance much, and hence can improve nanoscale DG CMOS speed substantially.
引用
收藏
页码:796 / 802
页数:7
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