Effect of hydrostatic pressure on the dc characteristics of AlGaN/GaN heterojunction field effect transistors -: art. no. 013505

被引:40
|
作者
Liu, Y
Ruden, PP
Xie, J
Morkoç, H
Son, KA
机构
[1] Univ Minnesota, Dept Elect & Comp Engn, Minneapolis, MN 55455 USA
[2] Virginia Commonwealth Univ, Dept Elect Engn, Richmond, VA 23284 USA
[3] CALTECH, Jet Prop Lab, Pasadena, CA 91109 USA
关键词
D O I
10.1063/1.2161812
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report the effect of compressive hydrostatic pressure on the current-voltage characteristics of AlGaN/GaN heterojunction field effect transistors (HFETs) on a sapphire substrate. The drain current increases with hydrostatic pressure and the maximum relative increase occurs when the gate bias is near threshold and drain bias is slightly larger than saturation bias. The increase of the drain current is associated with a pressure induced shift of the threshold voltage by -8.0 mV/kbar that is attributed to an increase of the polarization charge density at the AlGaN/GaN interface due to the piezoelectric effect. The results demonstrate the considerable potential of AlGaN/GaN HFETs for strain sensor applications. (c) 2006 American Institute of Physics.
引用
收藏
页数:3
相关论文
共 50 条
  • [31] Effect of threading dislocations on AlGaN/GaN heterojunction bipolar transistors
    McCarthy, L
    Smorchkova, I
    Xing, H
    Fini, P
    Keller, S
    Speck, J
    DenBaars, SP
    Rodwell, MJW
    Mishra, UK
    APPLIED PHYSICS LETTERS, 2001, 78 (15) : 2235 - 2237
  • [32] Growth and characterization of AlGaN/GaN/AlGaN field effect transistors
    Chen, Z.
    Pei, Y.
    Chu, R.
    Newman, S.
    Brown, D.
    Chung, R.
    Keller, S.
    DenBaars, S. P.
    Nakamura, S.
    Mishra, U. K.
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 7, NO 10, 2010, 7 (10): : 2404 - 2407
  • [33] Effect of hydrostatic pressure on the current-voltage characteristics of GaN/AlGaN/GaN heterostructure devices
    Liu, Y.
    Kauser, M.Z.
    Schroepfer, D.D.
    Ruden, P.P.
    Xie, J.
    Moon, Y.T.
    Onojima, N.
    Morko¸, H.
    Son, K.-A.
    Nathan, M.I.
    Journal of Applied Physics, 2006, 99 (11):
  • [34] Effect of hydrostatic pressure on the current-voltage characteristics of GaN/AlGaN/GaN heterostructure devices
    Liu, Y.
    Kauser, M. Z.
    Schroepfer, D. D.
    Ruden, P. P.
    Xie, J.
    Moon, Y. T.
    Onojima, N.
    Morkoc, H.
    Son, K. -A.
    Nathan, M. I.
    JOURNAL OF APPLIED PHYSICS, 2006, 99 (11)
  • [35] Comparison of low-temperature GaN, SiO2, and SiNx as gate insulators on AlGaN/GaN heterostructure field-effect transistors -: art. no. 064506
    Kao, CJ
    Chen, MC
    Tun, CJ
    Chi, GC
    Sheu, JK
    Lai, WC
    Lee, ML
    Ren, F
    Pearton, SJ
    JOURNAL OF APPLIED PHYSICS, 2005, 98 (06)
  • [36] Degradation in AlGaN/GaN heterojunction field effect transistors upon electrical stress: Effects of field and temperature
    Zhu, C. Y.
    Zhang, F.
    Ferreyra, R. A.
    Avrutin, V.
    Ozgur, U.
    Morkoc, H.
    APPLIED PHYSICS LETTERS, 2013, 103 (16)
  • [37] A thermal model for static current characteristics of AlGaN/GaN high electron mobility transistors including self-heating effect - art. no. 044501
    Chang, YC
    Zhang, YM
    Zhang, YM
    Tong, KY
    JOURNAL OF APPLIED PHYSICS, 2006, 99 (04)
  • [38] Technology and characterization of AlGaN/GaN field effect transistors
    Vescan, A
    Dietrich, R
    Wieszt, A
    Leier, H
    Käb, N
    Kohn, E
    Van Hove, JM
    Chow, PP
    Wowchack, AM
    COMPOUND SEMICONDUCTORS 1999, 2000, (166): : 503 - 506
  • [39] Ferroelectric PZT/AlGaN/GaN field effect transistors
    Kang, Youn-Seon
    Xiao, Bo
    Alivov, Ya. I.
    Fan, Qian
    Xie, Jinqiao
    Morkoc, Hadis
    GALLIUM NITRIDE MATERIALS AND DEVICES, 2006, 6121
  • [40] Self-heating and trapping effects in AlGaN/GaN heterojunction field-effect transistors
    Saidi, I.
    Gassoumi, M.
    Maaref, H.
    Mejri, H.
    Gaquiere, C.
    JOURNAL OF APPLIED PHYSICS, 2009, 106 (05)