Effect of hydrostatic pressure on the dc characteristics of AlGaN/GaN heterojunction field effect transistors -: art. no. 013505

被引:40
|
作者
Liu, Y
Ruden, PP
Xie, J
Morkoç, H
Son, KA
机构
[1] Univ Minnesota, Dept Elect & Comp Engn, Minneapolis, MN 55455 USA
[2] Virginia Commonwealth Univ, Dept Elect Engn, Richmond, VA 23284 USA
[3] CALTECH, Jet Prop Lab, Pasadena, CA 91109 USA
关键词
D O I
10.1063/1.2161812
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report the effect of compressive hydrostatic pressure on the current-voltage characteristics of AlGaN/GaN heterojunction field effect transistors (HFETs) on a sapphire substrate. The drain current increases with hydrostatic pressure and the maximum relative increase occurs when the gate bias is near threshold and drain bias is slightly larger than saturation bias. The increase of the drain current is associated with a pressure induced shift of the threshold voltage by -8.0 mV/kbar that is attributed to an increase of the polarization charge density at the AlGaN/GaN interface due to the piezoelectric effect. The results demonstrate the considerable potential of AlGaN/GaN HFETs for strain sensor applications. (c) 2006 American Institute of Physics.
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页数:3
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