Effect of hydrostatic pressure on the dc characteristics of AlGaN/GaN heterojunction field effect transistors -: art. no. 013505

被引:40
|
作者
Liu, Y
Ruden, PP
Xie, J
Morkoç, H
Son, KA
机构
[1] Univ Minnesota, Dept Elect & Comp Engn, Minneapolis, MN 55455 USA
[2] Virginia Commonwealth Univ, Dept Elect Engn, Richmond, VA 23284 USA
[3] CALTECH, Jet Prop Lab, Pasadena, CA 91109 USA
关键词
D O I
10.1063/1.2161812
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report the effect of compressive hydrostatic pressure on the current-voltage characteristics of AlGaN/GaN heterojunction field effect transistors (HFETs) on a sapphire substrate. The drain current increases with hydrostatic pressure and the maximum relative increase occurs when the gate bias is near threshold and drain bias is slightly larger than saturation bias. The increase of the drain current is associated with a pressure induced shift of the threshold voltage by -8.0 mV/kbar that is attributed to an increase of the polarization charge density at the AlGaN/GaN interface due to the piezoelectric effect. The results demonstrate the considerable potential of AlGaN/GaN HFETs for strain sensor applications. (c) 2006 American Institute of Physics.
引用
收藏
页数:3
相关论文
共 50 条
  • [21] Observation of a Current Plateau in the Transfer Characteristics of InGaN/AlGaN/AlN/GaN Heterojunction Field Effect Transistors
    闫俊达
    王权
    王晓亮
    肖红领
    姜丽娟
    殷海波
    冯春
    王翠梅
    渠慎奇
    巩稼民
    张博
    李百泉
    王占国
    侯洵
    Chinese Physics Letters, 2015, 32 (12) : 117 - 120
  • [22] Effect of gate trench fabrication technology on reliability of AlGaN/GaN heterojunction field effect transistors
    Chevtchenko, S. A.
    Schulz, M.
    Bahat-Treidel, E.
    John, W.
    Freyer, S.
    Kurpas, P.
    Wuerfl, J.
    MICROELECTRONICS RELIABILITY, 2014, 54 (9-10) : 2191 - 2195
  • [23] AlGaN/GaN/AlN quantum-well field-effect transistors with highly resistive AlN epilayers - art. no. 073513
    Fan, ZY
    Li, J
    Nakarmi, ML
    Lin, JY
    Jiang, HX
    APPLIED PHYSICS LETTERS, 2006, 88 (07)
  • [24] DC and microwave characteristics of high transconductance AlGaN/GaN heterostructure field effect transistors on SiC substrates
    Chen, Q
    Yang, JW
    Khan, MA
    Ping, AT
    Adesida, I
    NITRIDE SEMICONDUCTORS, 1998, 482 : 1071 - 1075
  • [25] AlGaN/GaN heterostructure field effect transistors
    Maeda, N.
    Saitoh, T.
    Tsubaki, K.
    NTT R and D, 2001, 50 (01): : 8 - 17
  • [26] Surface charging and current collapse in an AlGaN/GaN heterostructure field effect transistor -: art. no. 083506
    Sabuktagin, S
    Dogan, S
    Baski, AA
    Morkoç, H
    APPLIED PHYSICS LETTERS, 2005, 86 (08) : 1 - 3
  • [27] Effect of hydrostatic pressure on the barrier height of Ni Schottky contacts on n-AlGaN -: art. no. 022109
    Liu, Y
    Kauser, MZ
    Ruden, PP
    Hassan, Z
    Lee, YC
    Ng, SS
    Yam, FK
    APPLIED PHYSICS LETTERS, 2006, 88 (02) : 1 - 3
  • [28] Numerical simulation of transconductance of AlGaN/GaN heterojunction field effect transistors at high temperatures
    Chang, YC
    Zhang, YH
    Zhang, YM
    CHINESE PHYSICS, 2006, 15 (03): : 636 - 640
  • [29] Monte Carlo simulations of AlGaN/GaN heterojunction field-effect transistors (HFETs)
    Herbert, DC
    Uren, MJ
    Hughes, BT
    Hayes, DG
    Birbeck, JCH
    Balmer, R
    Martin, T
    Crow, GC
    Abram, RA
    Walmsley, M
    Davies, RA
    Wallis, RH
    Phillips, WA
    Jones, S
    JOURNAL OF PHYSICS-CONDENSED MATTER, 2002, 14 (13) : 3479 - 3497
  • [30] Bias induced strain in AlGaN/GaN heterojunction field effect transistors and its implications
    Anwar, AFM
    Webster, RT
    Smith, KV
    APPLIED PHYSICS LETTERS, 2006, 88 (20)