Bottom-contact fullerene C60 thin-film transistors with high field-effect mobilities

被引:40
|
作者
Kitamura, Masatoshi [1 ]
Aomori, Shigeru [1 ,2 ]
Na, Jong Ho [1 ,3 ]
Arakawa, Yasuhiko [1 ,3 ]
机构
[1] Univ Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
[2] Sharp Co Ltd, Adv Technol Res Labs, Nara 6328567, Japan
[3] Univ Tokyo, Adv Sci & Technol Res Ctr, Meguro Ku, Tokyo 1538904, Japan
关键词
D O I
10.1063/1.2959732
中图分类号
O59 [应用物理学];
学科分类号
摘要
Fullerene C-60 thin-film transistors (TFTs) with bottom-contact structure have been fabricated. The parasitic resistance was extracted using gated-transmission line method. The drain/source electrodes consisted of a single Au layer with no adhesion layer; the channel lengths ranged from 5 to 40 mu m. The field-effect mobilities in the saturation regime slightly depended on the channel length, ranging from 2.45 to 3.23 cm(2)/V s. The mobility of 3.23 cm(2)/V s was obtained from the TFT with a channel length of 5 mu m and is the highest in organic TFTs with bottom-contact structure. The high mobility is due to the low parasitic resistance. (C) 2008 American Institute of Physics.
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页数:3
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