Bottom-contact fullerene C60 thin-film transistors with high field-effect mobilities
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作者:
Kitamura, Masatoshi
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Univ Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, JapanUniv Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
Kitamura, Masatoshi
[1
]
Aomori, Shigeru
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Univ Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
Sharp Co Ltd, Adv Technol Res Labs, Nara 6328567, JapanUniv Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
Aomori, Shigeru
[1
,2
]
Na, Jong Ho
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Univ Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
Univ Tokyo, Adv Sci & Technol Res Ctr, Meguro Ku, Tokyo 1538904, JapanUniv Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
Na, Jong Ho
[1
,3
]
Arakawa, Yasuhiko
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Univ Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
Univ Tokyo, Adv Sci & Technol Res Ctr, Meguro Ku, Tokyo 1538904, JapanUniv Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
Arakawa, Yasuhiko
[1
,3
]
机构:
[1] Univ Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
[2] Sharp Co Ltd, Adv Technol Res Labs, Nara 6328567, Japan
[3] Univ Tokyo, Adv Sci & Technol Res Ctr, Meguro Ku, Tokyo 1538904, Japan
Fullerene C-60 thin-film transistors (TFTs) with bottom-contact structure have been fabricated. The parasitic resistance was extracted using gated-transmission line method. The drain/source electrodes consisted of a single Au layer with no adhesion layer; the channel lengths ranged from 5 to 40 mu m. The field-effect mobilities in the saturation regime slightly depended on the channel length, ranging from 2.45 to 3.23 cm(2)/V s. The mobility of 3.23 cm(2)/V s was obtained from the TFT with a channel length of 5 mu m and is the highest in organic TFTs with bottom-contact structure. The high mobility is due to the low parasitic resistance. (C) 2008 American Institute of Physics.
机构:
UCL, London Ctr Nanotechnol, Dept Elect & Elect Engn, London WC1H 0AH, England
UCL, Dept Phys & Astron, London WC1H 0AH, EnglandUCL, London Ctr Nanotechnol, Dept Elect & Elect Engn, London WC1H 0AH, England
Stott, James
Kumatani, Akichika
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Natl Inst Mat Sci, WPI Int Ctr Mat Nanoarchitecton MANA, Tsukuba, Ibaraki 3050044, JapanUCL, London Ctr Nanotechnol, Dept Elect & Elect Engn, London WC1H 0AH, England
Kumatani, Akichika
Minari, Takeo
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Natl Inst Mat Sci, WPI Int Ctr Mat Nanoarchitecton MANA, Tsukuba, Ibaraki 3050044, JapanUCL, London Ctr Nanotechnol, Dept Elect & Elect Engn, London WC1H 0AH, England
Minari, Takeo
Tsukagoshi, Kazuhito
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Natl Inst Mat Sci, WPI Int Ctr Mat Nanoarchitecton MANA, Tsukuba, Ibaraki 3050044, Japan
Japan Sci & Technol Agcy, Kawaguchi, Saitama 3320012, JapanUCL, London Ctr Nanotechnol, Dept Elect & Elect Engn, London WC1H 0AH, England
Tsukagoshi, Kazuhito
Heutz, Sandrine
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Univ London Imperial Coll Sci Technol & Med, Dept Mat, London Ctr Nanotechnol, London SW7 2AZ, EnglandUCL, London Ctr Nanotechnol, Dept Elect & Elect Engn, London WC1H 0AH, England
Heutz, Sandrine
Aeppli, Gabriel
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UCL, London Ctr Nanotechnol, Dept Elect & Elect Engn, London WC1H 0AH, England
UCL, Dept Phys & Astron, London WC1H 0AH, EnglandUCL, London Ctr Nanotechnol, Dept Elect & Elect Engn, London WC1H 0AH, England
Aeppli, Gabriel
Nathan, Arokia
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UCL, London Ctr Nanotechnol, Dept Elect & Elect Engn, London WC1H 0AH, England
UCL, Dept Phys & Astron, London WC1H 0AH, EnglandUCL, London Ctr Nanotechnol, Dept Elect & Elect Engn, London WC1H 0AH, England