C-60 field-effect transistors (FETs) have been fabricated with parylene gate dielectric on Si/SiO2, on polyethylene terephthalate, and commercially available transparent sheet substrates. The best performance of the C-60 FET device is achieved with parylene as gate dielectric: field-effect mobility of 0.41 cm(2) V-1 s(-1) and on-off ratio of similar to 10(7). The excellent FET characteristics are recorded without any annealing, and the devices were kept in He atmosphere after an exposure to air. This result suggests the parylene gate dielectric to be highly H2O repellent. The mechanical flexibility and air-exposure effect were studied for the C-60 FET with parylene gate dielectric. (C) 2008 American Institute of Physics.
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Univ Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, JapanUniv Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
Kitamura, Masatoshi
Aomori, Shigeru
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Univ Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
Sharp Co Ltd, Adv Technol Res Labs, Nara 6328567, JapanUniv Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
Aomori, Shigeru
Na, Jong Ho
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Univ Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
Univ Tokyo, Adv Sci & Technol Res Ctr, Meguro Ku, Tokyo 1538904, JapanUniv Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
Na, Jong Ho
Arakawa, Yasuhiko
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Univ Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
Univ Tokyo, Adv Sci & Technol Res Ctr, Meguro Ku, Tokyo 1538904, JapanUniv Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan