self-aligned Double Patterning Friendly Configuration for Standard Cell Library Considering Placement Impact

被引:3
|
作者
Gao, Jhih-Rong [1 ]
Yu, Bei [1 ]
Huang, Ru
Pan, David Z. [1 ]
机构
[1] Univ Texas Austin, ECE Dept, Austin, TX 78712 USA
来源
DESIGN FOR MANUFACTURABILITY THROUGH DESIGN-PROCESS INTEGRATION VII | 2013年 / 8684卷
关键词
D O I
10.1117/12.2011660
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
self-aligned double patterning (SADP) has become a promising technique to push pattern resolution limit to sub-22nm technology node. Although SADP provides good overlay controllability, it encounters many challenges in physical design stages to obtain conflict-free layout decomposition. In this paper, we study the impact on placement by different standard cell layout decomposition strategies. We propose a SADP friendly standard cell configuration which provides pre-coloring results for standard cells. These configurations are brought into the placement stage to help ensure layout decomposability and save the extra effort for solving conflicts in later stages.
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页数:10
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