A new charge-based analytical compact model for the drain current of junctionless (JL) triple-gate MOSFETs is presented, which includes the short-channel effects, the saturation velocity overshoot, the series resistance, and the mobility degradation effects. The proposed model consists of a single analytical equation that covers the depletion operation region in which the bulk conduction determines the drain current. The model is supported by experimental measurements in JL nanowire transistors with channel length varying from 95 to 25 nm and doping concentration 2 x 10(19) cm(-3). The overall results reveal the very good accuracy of the proposed analytical compact model, making it suitable for circuit simulation tools.
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FEI, Ctr Univ, Dept Elect Engn, Av Humberto de Alencar Castelo Branco 3972, BR-09850901 Sao Bernardo Do Campo, BrazilFEI, Ctr Univ, Dept Elect Engn, Av Humberto de Alencar Castelo Branco 3972, BR-09850901 Sao Bernardo Do Campo, Brazil
Paz, B. C.
Casse, M.
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CEA LETI Minatec, 17 Rue Martyrs, F-38054 Grenoble, FranceFEI, Ctr Univ, Dept Elect Engn, Av Humberto de Alencar Castelo Branco 3972, BR-09850901 Sao Bernardo Do Campo, Brazil
Casse, M.
Barraud, S.
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CEA LETI Minatec, 17 Rue Martyrs, F-38054 Grenoble, FranceFEI, Ctr Univ, Dept Elect Engn, Av Humberto de Alencar Castelo Branco 3972, BR-09850901 Sao Bernardo Do Campo, Brazil
Barraud, S.
Reimbold, G.
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CEA LETI Minatec, 17 Rue Martyrs, F-38054 Grenoble, FranceFEI, Ctr Univ, Dept Elect Engn, Av Humberto de Alencar Castelo Branco 3972, BR-09850901 Sao Bernardo Do Campo, Brazil
Reimbold, G.
Faynot, O.
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CEA LETI Minatec, 17 Rue Martyrs, F-38054 Grenoble, FranceFEI, Ctr Univ, Dept Elect Engn, Av Humberto de Alencar Castelo Branco 3972, BR-09850901 Sao Bernardo Do Campo, Brazil
Faynot, O.
Avila-Herrera, F.
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CINVESTAV, Dept Elect Engn, Av Inst Politecn Nacl 2508,AP 14-740, Mexico City 07360, DF, MexicoFEI, Ctr Univ, Dept Elect Engn, Av Humberto de Alencar Castelo Branco 3972, BR-09850901 Sao Bernardo Do Campo, Brazil
Avila-Herrera, F.
Cerdeira, A.
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CINVESTAV, Dept Elect Engn, Av Inst Politecn Nacl 2508,AP 14-740, Mexico City 07360, DF, MexicoFEI, Ctr Univ, Dept Elect Engn, Av Humberto de Alencar Castelo Branco 3972, BR-09850901 Sao Bernardo Do Campo, Brazil
Cerdeira, A.
Pavanello, M. A.
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FEI, Ctr Univ, Dept Elect Engn, Av Humberto de Alencar Castelo Branco 3972, BR-09850901 Sao Bernardo Do Campo, BrazilFEI, Ctr Univ, Dept Elect Engn, Av Humberto de Alencar Castelo Branco 3972, BR-09850901 Sao Bernardo Do Campo, Brazil
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Peking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Key Lab Integrated Microsyst, Shenzhen 518055, Peoples R ChinaPeking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Key Lab Integrated Microsyst, Shenzhen 518055, Peoples R China
Xiao, Ying
Zhang, Baili
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Peking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Key Lab Integrated Microsyst, Shenzhen 518055, Peoples R ChinaPeking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Key Lab Integrated Microsyst, Shenzhen 518055, Peoples R China
Zhang, Baili
Lou, Haijun
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Peking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Key Lab Integrated Microsyst, Shenzhen 518055, Peoples R ChinaPeking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Key Lab Integrated Microsyst, Shenzhen 518055, Peoples R China
Lou, Haijun
Zhang, Lining
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Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Hong Kong, Hong Kong, Peoples R ChinaPeking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Key Lab Integrated Microsyst, Shenzhen 518055, Peoples R China