Synthesis of vertically aligned carbon nanofibers using inductively coupled plasma-enhanced chemical vapor deposition

被引：17

作者：

Shoukat, Rizwan ^{[1
]}

Khan, Muhammad Imran ^{[2
,3
]}

机构：

[1] Univ Freiburg, Dept Microsyst Engn IMTEK, D-79110 Freiburg, Germany

[2] UET, Dept Elect Engn, Taxila 47050, Pakistan

[3] USTC, Micronano Elect Syst Integrat R&D Ctr MESIC, Hefei 230027, Anhui, Peoples R China

来源：

ELECTRICAL ENGINEERING | 2018年 / 100卷 / 02期

关键词：

Carbon nanofibers; RF plasma; Glow discharge; Catalyst; Nanotechnology; NANOTUBES; GROWTH; FIELD;

D O I：

10.1007/s00202-017-0561-z

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This journal paper reports a highly reliable and efficient method for the growth of vertically aligned carbon nanofibers. The inductively coupled plasma-enhanced chemical vapor deposition method utilizes a low substrate temperature (approx. 650 degrees C) for the growth purpose using toluene as carbon source. Carbon nanofibers are characterized using SEM (scanning electron microscopy), EDX (energy-dispersive X-ray) and Raman spectroscopy. Uniform carbon nanofibers are grown on different substrates. The results further show that the use of catalyst is not mandatory to grow the carbon nanofibers.

引用

页码：997 / 1002

页数：6

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