Fabrication of vertically aligned carbon nanostructures by microwave plasma-enhanced chemical vapor deposition

被引：8
|
作者：
Hiramatsu, M
Ito, K
Lau, CH
Foord, JS
Hori, M
机构：
[1] Meijo Univ, Dept Elect & Elect Engn, Tempa Ku, Nagoya, Aichi 4688502, Japan
[2] Univ Oxford, Phys & Theoret Chem Lab, Oxford OX1 3QZ, England
[3] Nagoya Univ, Dept Quantum Engn, Nagoya, Aichi 4648603, Japan
来源：
DIAMOND AND RELATED MATERIALS | 2003年 / 12卷 / 3-7期
关键词：
nanostructures; plasma-enhanced chemical vapor deposition; field emission;
D O I：
10.1016/S0925-9635(03)00028-1
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Carbon nano-rope films were fabricated on the Ni-catalysed Si substrate by microwave plasma-enhanced chemical vapor deposition employing a mixture of acetylene and hydrogen. These nano-ropes were in the form of self-assembled, stranded carbon nano-fibers and were aligned perpendicular to the substrate. The field emission characteristics for the nano-rope films were observed. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：786 / 789
页数：4
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